Bumped electrode arrays for microassemblers

US10043687B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10043687-B2
Application numberUS-201615391140-A
CountryUS
Kind codeB2
Filing dateDec 27, 2016
Priority dateDec 27, 2016
Publication dateAug 7, 2018
Grant dateAug 7, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An apparatus including a bumped electrode array and a method of fabricating a bumped electrode array is disclosed. The method includes providing a substrate for the electrode array. The method also includes disposing a plurality of non-planar structures including electrodes above the substrate of the electrode array. The method further includes disposing a dielectric layer above the plurality of non-planar structures having a defined radius of curvature.

First claim

Opening claim text (preview).

What is claimed is: 1. A system comprising: an assembly medium; a plurality of mobile particles at least partially submersed in the assembly medium; and an array, at least partially submersed in the assembly medium, the array comprising: a substrate; a plurality of non-planar structures comprised of electrodes disposed above the substrate, wherein the plurality of non-planar structures comprise a plurality of first curved surfaces, wherein the plurality of non-planar structures disposed above the substrate are to manipulate each of the plurality of mobile particles into a predetermined position and orientation; and a dielectric layer disposed above and between the plurality of non-planar structures, wherein the dielectric layer conforms to the plurality of first curved surfaces of the plurality of non-planar structures to form a plurality of second curved surfaces of the dielectric layer, wherein the plurality of second curved surfaces of the dielectric layer facilitates the movement of each of the plurality of mobile particles through the assembly medium to the predetermined position and orientation and have a defined radius of curvature. 2. The system of claim 1 , further comprising: a power source operatively coupled to the array to provide power to the plurality of non-planar structures comprising electrodes and to provide a field to facilitate the movement of each of the plurality of mobile particles through the assembly medium to the predetermined position and orientation. 3. The system of claim 1 , further comprising: a controller operatively coupled to the power source to control a field conducted through individual electrodes of the plurality of non-planar structures. 4. The system of claim 1 , wherein the substrate comprises a plurality of third curved surfaces, wherein the plurality of non-planar structures are disposed above and aligned with the plurality of third curved surfaces of the substrate. 5. The system of claim 1 , wherein each of the plurality of non-planar structures comprise an electrode and a reflow metal above the electrode that is reflowed to form a curved surface of the first plurality of curved surfaces. 6. The system of claim 1 , wherein the mobile particle is comprised of at least one substantially planar surface. 7. The system of claim 6 , wherein the plurality of second curved surfaces has a pitch that is less than or equal to a length of the substantially planar surface of the mobile particle. 8. The system of claim 7 , wherein the pitch is greater than or equal to 1 micron. 9. The system of claim 1 , wherein the plurality of second curved surfaces have the defined radius of curvature, a pitch, and a height to prevent a tilt angle of the mobile particle from exceeding 45 degrees.

Assignees

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Classifications

  • used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate · CPC title

  • characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

  • using temporarily an auxiliary support · CPC title

  • for positioning, orientation or alignment · CPC title

  • batch processes · CPC title

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What does patent US10043687B2 cover?
An apparatus including a bumped electrode array and a method of fabricating a bumped electrode array is disclosed. The method includes providing a substrate for the electrode array. The method also includes disposing a plurality of non-planar structures including electrodes above the substrate of the electrode array. The method further includes disposing a dielectric layer above the plurality o…
Who is the assignee on this patent?
Palo Alto Res Ct Inc
What technology area does this patent fall under?
Primary CPC classification H10W90/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 07 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).