Holey optical device

Patent metadata

Field	Value
Publication number	US-10042091-B2
Application number	US-201314431544-A
Country	US
Kind code	B2
Filing date	Sep 26, 2013
Priority date	Sep 29, 2012
Publication date	Aug 7, 2018
Grant date	Aug 7, 2018

Abstract

A planar optical device, comprised of sets of nanometer-scale holes milled into a thin metal or ceramic film of subwavelength thickness serves to form arbitrary waveform of light. The holes form a pattern, preferrably rings, of various sizes in order to achieve a given phase front of light due to photonic effect. When designed as a lens, the device focuses incident light into a tight focal spot. In symmetric design, the focusing property of the device does not depend on the incident polarization angle. The lens can be manufactured based on high-throughput fabrication methods and easily integrated with a chip or placed at the end of an optical fiber.

First claim

The invention claimed is:

1. A planar polarization-independent optical device for arbitrary waveform formation, comprising:
a plurality of subwavelength-scale holes with varying radii milled vertically into a film, wherein said holes form a pattern, wherein a radius of each hole determines an effective refractive index for said hole, said effective refractive index modifying a phase and an intensity of an incoming electromagnetic radiation as the radiation propagates through said hole, and wherein a desired phase front of total outputted electromagnetic radiation emitted out of all holes is created, thus achieving phase control in said film, wherein the device is operating equally for each linearly polarized radiation simultaneously, wherein the each linearly polarized radiation is normally incident on the device.

2. The device of claim 1 , wherein a focal distance of the optical device, which is operating as a lens, is controlled by adjustment of a wavelength of the incoming electromagnetic radiation.

3. The device of claim 2 , wherein a focal distance of the optical device is in the range from one to twenty micrometer.

4. The device of claim 1 , further comprising a filler applied to the device after the holes are milled, the filler filling the holes.

5. The device of claim 4 , wherein the filler is a non-linear Kerr medium.

6. The device of claim 5 , wherein the Kerr medium changes an intensity of incident electromagnetic radiation and controls the device operation in real time.

7. The device of claim 6 , further comprising a control unit, the control unit applying a signal to the device thus changing an operating function of the device in real time with THz frequency.

8. The device of claim 4 , wherein the filler is a gain medium serving for amplification of the radiation intensity and compensation for plasmonic losses.

9. The device of claim 1 , wherein said film is a pure metal film comprised of gold, aluminum, silver, or copper.

10. The device of claim 1 , wherein said film is a ceramic film made of silicon carbide.

11. The device of claim 1 , wherein said film is a non-stoichiometric ceramic film made of titanium nitride, or zirconium nitride.

12. The device of claim 1 , wherein the phase change increases as the hole radius becomes larger.

13. The device of claim 1 , wherein said film comprises gold, silver, or copper.

14. A method for arbitrary waveform formation, comprising:
milling a pattern of a plurality of subwavelength-scale holes into a film, wherein said pattern comprises holes of varying width corresponding to a desired effective refractive index within each hole, wherein said effective refractive index of each individual hole modifies a phase and an intensity magnitude of the radiation propagating through said individual hole, and outputting an output radiation, wherein said output radiation propagates through each individual hole and experiences various refractive modifications, thus outputting a desired phase front of radiation from all holes in said film, wherein an entirety of the film comprises a pure metal, wherein a device containing the film is operating equally for each linearly polarized radiation simultaneously, wherein the each linearly polarized radiation is normally incident on the device.

15. The method of claim 14 , wherein the radiation is a radiation in an optical range.

16. The method of claim 14 , wherein prior to milling,
depositing the film on a fiber core covered with an adhesive layer.

17. The method of claim 14 , further comprising: applying a filler to the holes after the holes are milled, the filler filling the holes, the filler is a non-linear Kerr medium.

18. The method of claim 17 , wherein the Kerr medium changes an intensity of incident
electromagnetic radiation and controls the device operation in real time.

19. The method of claim 14 , wherein the pure metal film comprises gold, aluminum, silver, or copper.

Assignees

• Purdue Research Foundation

Inventors

• Kildishev Alexander
• Ishii Satoshi
• Shalaev Vladimir

Classifications

• G02F2203/13

  involving THZ radiation · CPC title

• G02B3/08 Primary

  with discontinuous faces, e.g. Fresnel lens {(diffractive Fresnel lenses G02B5/1876)} · CPC title

• G02B3/0087

  with index gradient · CPC title

• G02F1/365

  in an optical waveguide structure (G02F1/377, {G02F1/395} take precedence) · CPC title

• G02B6/1226

  involving surface plasmon interaction · CPC title