Gas laser apparatus

Patent metadata

Field	Value
Publication number	US-10038295-B2
Application number	US-201715631676-A
Country	US
Kind code	B2
Filing date	Jun 23, 2017
Priority date	Nov 25, 2013
Publication date	Jul 31, 2018
Grant date	Jul 31, 2018

Abstract

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

First claim

The invention claimed is:

1. A gas laser apparatus comprising:
a first laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas;
a second laser chamber connected through a sixth control valve to the first laser gas supply source and connected through a seventh control valve to the second laser gas supply source;
a common pipe connected to the second laser gas supply source and divided into a first branch pipe in which the second control valve is disposed and a second branch pipe in which the seventh control valve is disposed;
a fourth control valve disposed in the common pipe;
a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the first laser chamber and at least a part of a gas exhausted from the second laser chamber; and
a booster pump, connected through a third control valve to the common pipe between the fourth control valve and a place where the common pipe is divided into the first and second branch pipes, the booster pump being configured to raise a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the first laser chamber and an operating gas pressure of the second laser chamber.

2. The gas laser apparatus according to claim 1 , further comprising a controller,
the controller being configured to calculate, on a basis of a first amount of a gas supplied from the booster pump through the third control valve and the second control valve to the first laser chamber, a second amount of the first laser gas that is to be supplied to the first laser chamber and control the first control valve on a basis of a result of the calculation of the second amount, and
the controller being configured to calculate, on a basis of a third amount of a gas supplied from the booster pump through the third control valve and the seventh control valve to the second laser chamber, a fourth amount of the first laser gas that is to be supplied to the second laser chamber and control the sixth control valve on a basis of a result of the calculation of the fourth amount.

3. The gas laser apparatus according to claim 1 , further comprising:
a first tank disposed between the purification column and the booster pump;
a first pressure sensor that measures a first pressure inside the first tank;
a second tank disposed between the booster pump and the third control valve;
a second pressure sensor that measures a second pressure inside the second tank; and
a controller that controls the booster pump on a basis of the first pressure and controls the third control valve on a basis of the second pressure.

4. The gas laser apparatus according to claim 3 , wherein the controller controls the booster pump so that the first pressure is equal to or higher than a first predetermined value and equal to or lower than a second predetermined value and permits the third control valve to open if the second pressure is equal to or higher than a third predetermined value.

5. The gas laser apparatus according to claim 1 , further comprising:
a controller that selectively executes a first control mode in which the third control valve is closed and the fourth control valve is opened and a second control mode in which the fourth control valve is closed and the third control valve is opened.

6. The gas laser apparatus according to claim 5 , further comprising:
a first tank disposed between the purification column and the booster pump;
a first pressure sensor that measures a first pressure inside the first tank;
a second tank disposed between the booster pump and the third control valve; and
a second pressure sensor that measures a second pressure inside the second tank,
wherein the controller controls the booster pump on a basis of the first pressure and controls the third control valve on a basis of the second pressure.

7. The gas laser apparatus according to claim 6 , wherein the controller controls the booster pump so that the first pressure is equal to or higher than a first predetermined value and equal to or lower than a second predetermined value and permits the third control valve to open if the second pressure is equal to or higher than a third predetermined value.

8. The gas laser apparatus according to claim 1 , wherein
the first laser gas contains a fluorine gas, an argon gas, a neon gas, and a xenon gas, and
the second laser gas contains an argon gas, a neon gas, and a xenon gas.

9. The gas laser apparatus according to claim 8 , wherein the first laser chamber and the second laser chamber are connected through a fifth control valve to a third laser gas supply source that supplies a third laser gas having a higher xenon gas concentration than the second laser gas.

10. The gas laser apparatus according to claim 9 , further comprising:
a xenon concentration meter that measures a xenon gas concentration of the gas having passed through the purification column; and
a controller that controls the fifth control valve on a basis of the xenon gas concentration.

11. The gas laser apparatus according to claim 9 , further comprising:
a first operating characteristic measuring instrument that measures a first operating characteristic of laser light that is outputted from the first laser chamber;
a second operating characteristic measuring instrument that measures a second operating characteristic of laser light that is outputted from the second laser chamber; and
a controller that controls the fifth control valve on a basis of the first operating characteristic and the second operating characteristic.

12. The gas laser apparatus according to claim 8 , wherein the first laser chamber and the second laser chamber are connected through a fifth control valve and the common pipe to a third laser gas supply source that supplies a third laser gas having a higher xenon gas concentration than the second laser gas.

13. The gas laser apparatus according to claim 8 , wherein
the first laser chamber is connected through an eighth control valve to a fourth laser gas supply source that supplies a fourth laser gas having a higher xenon gas concentration than the second laser gas, and
the second laser chamber is connected through a ninth control valve to a fifth laser gas supply source that supplies a fifth laser gas having a higher xenon gas concentration than the second laser gas.

14. The gas laser apparatus according to claim 13 , further comprising:
a first operating characteristic measuring instrument that measures a first operating characteristic of laser light that is outputted from the first laser chamber;
a second operating characteristic measuring instrument that measures a second operating characteristic of laser light that is outputted from the second laser chamber; and
a controller that controls the eighth control valve on a basis of the first operating characteristic and controls the ninth control valve on a basis of the second operating characteristic.

Assignees

• Gigaphoton Inc

Inventors

• Suzuki Natsushi
• Wakabayashi Osamu
• Tsushima Hiroaki
• Yashiro Masanori

Classifications

• B01D2259/40003

  Methods relating to valve switching · CPC title

• B01D2251/404

  of calcium · CPC title

• H01S3/104

  in gas lasers · CPC title

• H01S3/036 Primary

  Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube {(H01S3/031 takes precedence)} · CPC title

• H01S3/225

  comprising an excimer or exciplex · CPC title