Micro electro mechanical system, semiconductor device, and manufacturing method thereof

US10035388B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10035388-B2
Application numberUS-201715460293-A
CountryUS
Kind codeB2
Filing dateMar 16, 2017
Priority dateOct 17, 2005
Publication dateJul 31, 2018
Grant dateJul 31, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved.

First claim

Opening claim text (preview).

What is claimed is: 1. A tire comprising a wheel and a semiconductor device attached to the wheel, the semiconductor device comprising: a transistor over a film substrate; an insulating layer over the transistor; a sensor over the insulating layer, the sensor comprising a first electrode and a second electrode and electrically connected to the transistor; and a first spacer layer between the insulating layer and the sensor, wherein the first spacer layer comprises an anisotropic conductive agent. 2. The tire according to claim 1 , wherein the semiconductor device further comprises: a substrate over the sensor; and a second spacer layer between the substrate and the sensor. 3. The tire according to claim 2 , wherein the second spacer layer overlaps with the first spacer layer. 4. The tire according to claim 2 , wherein a part of the first electrode and a part of the second electrode contact with both of the first and second spacer layers. 5. The tire according to claim 1 , wherein the sensor is a pressure sensor. 6. The tire according to claim 1 , wherein the sensor is a temperature sensor. 7. The tire according to claim 1 , wherein the semiconductor device is attached to a valve part of the wheel. 8. A vehicle having the tire according to claim 1 . 9. A tire comprising a wheel and a semiconductor device attached to the wheel, the semiconductor device comprising: a control circuit including a transistor over a film substrate; a sensor over the control circuit, the sensor comprising a first electrode and a second electrode and electrically connected to the control circuit; and an antenna electrically connected to the control circuit; and a first spacer layer between the control circuit and the sensor, wherein the first spacer layer comprises an anisotropic conductive agent. 10. The tire according to claim 9 , wherein the semiconductor device further comprises: a substrate over the sensor; and a second spacer layer between the substrate and the sensor. 11. The tire according to claim 10 , wherein the second spacer layer overlaps with the first spacer layer. 12. The tire according to claim 10 , wherein a part of the first electrode and a part of the second electrode contact with both of the first and second spacer layers. 13. The tire according to claim 9 , wherein the sensor is a pressure sensor. 14. The tire according to claim 9 , wherein the sensor is a temperature sensor. 15. The tire according to claim 9 , wherein the semiconductor device is attached to a valve part of the wheel. 16. A vehicle having the tire according to claim 9 .

Assignees

Inventors

Classifications

  • the material containing zirconium, e.g. ZrO2 · CPC title

  • the material containing titanium, e.g. TiO2 · CPC title

  • the material containing tantalum, e.g. Ta2O5 · CPC title

  • characterised by the metal · CPC title

  • carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title

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Frequently asked questions

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What does patent US10035388B2 cover?
The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not req…
Who is the assignee on this patent?
Semiconductor Energy Lab
What technology area does this patent fall under?
Primary CPC classification B60C23/0493. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 31 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).