Porous barrier for evenly distributed purge gas in a microenvironment

Patent metadata

Field	Value
Publication number	US-10032660-B2
Application number	US-201514734840-A
Country	US
Kind code	B2
Filing date	Jun 9, 2015
Priority date	Dec 10, 2009
Publication date	Jul 24, 2018
Grant date	Jul 24, 2018

Abstract

An improved system and method for purging a microenvironment to desired levels of relative humidity, oxygen, or particulates through the implementation of a purge gas delivery apparatus and method that provides even distribution of the purging gas within the microenvironment. A substrate container has a tower therein with a fluid flow passageway extending the length of the tower. Apertures with porous media between the aperture and fluid flow passageway regulate the volume and pressure of air discharging at each aperture. Alternatively, the tower may be formed of a porous tubular polymeric material. A sleeve may direct the discharge purge gas in the interior.

First claim

The invention claimed is:

1. A system for transporting substrates comprising:
a substrate container having a container portion with an opening for loading/unloading substrates, a door adapted to sealably cover the opening;
an apparatus comprising an inlet tower adapted to be mounted to the substrate container for admitting a gaseous working fluid to an interior of the container portion for purging the substrate container with the gaseous working fluid;
the inlet tower having a length and one or more outlet regions arranged along the length of the tower, and an interior flow passageway extending the length of the tower,
hydrophobic polymer filter media positioned at each outlet region of the inlet tower intermediate to the one or more outlet regions and the interior flow passageway whereby the gaseous working fluid being admitted to the substrate container may be filtered.

2. The apparatus of claim 1 , wherein the one or more outlet regions of said inlet tower comprises a plurality of orifices and the hydrophobic filter media covers the orifices.

3. The apparatus of claim 1 , wherein the hydrophobic filter media comprises polyethylene, polypropylene, polytetrafluoroethylene, or a perfluoroalkoxy polymer.

4. A method comprising controlling the environment within a wafer transport container by providing an inlet tower adapted to be mounted to a container portion for admitting a gaseous working fluid to an interior of the container portion for purging the container portion with the gaseous working fluid, wherein the inlet tower has a length and one or more outlet regions arranged along the length of the tower, and an interior flow passageway extending the length of the tower, and wherein hydrophobic polymer filter media is positioned at each outlet region of the inlet tower intermediate the one or more outlet regions and the interior flow passageway whereby the gaseous working fluid is admitted to the substrate container may be filtered.

5. The method of claim 4 wherein, the hydrophobic filter media comprises polyethylene, polypropylene, polytetrafluoroethylene, or a perfluoroalkoxy polymer.

6. The method of claim 4 wherein, the one or more outlet regions of said inlet tower comprises a plurality of orifices and the hydrophobic filter media covers the orifices.

7. The method of claim 4 wherein, the hydrophobic filter media comprises one of a sintered material, fibrous material, or foamed material.

8. A method of providing equalized purging flow of a gaseous fluid along the length of a purge tower in a substrate container, the method comprising providing a purge tower of a tubing portion and formed of a hydrophobic porous polymer, the tubing portion closed at a top end and connected at the bottom end to a purge port; connecting the purge port to a purge gas source exterior of the container, providing a pressurization of the purge tower such that flow velocities and volumes near the top of the tower are equal or substantially equal to such flow velocities and volumes near the bottom of the tower.

9. The method of claim 8 wherein the method further provides adjusting the direction of the purge flow utilizing an elongate sleeve with a lengthwise slot, the sleeve conforming to and fitted to the tubing portion.

10. A substrate container comprising:
a substrate container having a container portion with an opening for loading/unloading substrates, a door adapted to sealably cover the opening; the substrate container having
a substrate carrying region in the transport container and further comprising an inlet tower mounted to container portion in the interior of the for admitting a gaseous working fluid to the interior of the container for purging the wafer container body with the gaseous working fluid;
the inlet tower having a length and one or more outlet regions arranged along the length of the tower, and an interior flow passageway extending the length of the tower, the tower comprising a hydrophobic polymer filter media formed as a tubular structure extending the length of the tower, the tubular structure having an axial fluid flow passageway connecting to a purge port at the bottom of the container portion for allowing purge gas to flow up the tubular structure and to exit the tubular structure along the entire length of the tubular structure.

Assignees

• Entegris Inc

Inventors

• Burns John
• Smith Mark
• Fuller Matthew

Classifications

• H10P72/1916

  characterised by sealing arrangements · CPC title

• H10P72/1926 Primary

  characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier · CPC title

• H01L21/67393 Primary

  Electricity · mapped topic

• H01L21/67376

  Electricity · mapped topic