Substrate coating on one or more sides

Patent metadata

Field	Value
Publication number	US-10030300-B2
Application number	US-201113702387-A
Country	US
Kind code	B2
Filing date	May 23, 2011
Priority date	Jun 11, 2010
Publication date	Jul 24, 2018
Grant date	Jul 24, 2018

Abstract

A method for coating a substrate on one or more sides having catalytically active material producible by material deposition under vacuum in a vacuum chamber, using the following steps: loading a substrate in the chamber evacuating the chamber, cleaning the substrate by introducing a gaseous reducing agent, removing the gaseous reducing agent, applying an intermediate layer by means of vacuum arc evaporation, wherein a substrate comprising the same or similar material is introduced into the vacuum chamber, controlling the chamber temperature, coating by vacuum arc evaporation, a metal taken from the group ruthenium, iridium, titanium and mixtures thereof while oxygen is supplied, in a last step the coated substrate is removed from the chamber, wherein at least 99% of the substrate coating is free of constituents originally contained in the substrate itself, and at least 99% of the coating applied on the intermediate layer is kept free of non-oxidized metals.

First claim

The invention claimed is:

1. A method for coating one or more sides of substrates with catalytically active material, comprising material deposition under vacuum in a vacuum chamber, wherein the following steps are performed:
loading the vacuum chamber with at least one substrate,
closing and evacuating the vacuum chamber,
cleaning the substrate by introducing a gaseous reducing agent into the vacuum chamber,
removing the gaseous reducing agent,
applying an intermediate layer by means of vacuum arc deposition, wherein a substrate comprising the same material as the intermediate layer is introduced into the vacuum chamber,
applying a coating by means of vacuum arc deposition at a temperature of 150° C. to 400° C., wherein at least one metal taken from the group of ruthenium, iridium, titanium and mixtures thereof is introduced into the vacuum chamber and oxygen is supplied throughout the coating period,
in a last step the vacuum chamber is re-flooded and the coated substrate is removed from the chamber;
wherein the above steps and transitions from one step to the next are performed under vacuum which is set by means of a protective gas,
wherein migration of atoms from the intermediate layer into an outer layer of the coating on the intermediate layer is avoided, and
wherein at least 99% of the intermediate layer on one or more sides is kept free of constituents initially contained in the substrate, wherein at least 99% of the intermediate layer is kept free of non-oxidised metals; and
wherein a substrate coating, consisting of the intermediate layer and the coating applied to it, has a layer thickness of 1.5 to 2.5 μm.

2. The substrate coating method according to claim 1 , wherein the intermediate layer is completely kept free of constituents initially contained in the substrate and the coating applied onto the intermediate layer is completely kept free of non-oxidised metals.

3. The substrate coating method according to claim 1 , wherein the substrate is selected from a group comprising stainless steel and elements of the nickel group as well as coated stainless steel from elements of the nickel group.

4. The substrate coating method according to claim 1 , wherein the coating applied onto the intermediate layer consists of ruthenium dioxide.

5. The substrate coating method according to claim 1 , wherein the coating applied onto the intermediate layer is made up of a mixture of the metal oxides of ruthenium dioxide:iridium dioxide:titanium dioxide.

6. The substrate coating method according to claim 1 , wherein the intermediate layer features uneven areas on its surface.

7. The substrate coating method according to claim 1 , wherein the coating applied onto the intermediate layer features uneven areas on its surface.

8. A substrate comprising a substrate coating on one or more sides of the substrate, the substrate coating comprising an intermediate layer and a coating on the intermediate layer, the substrate prepared by a process comprising material deposition under vacuum in a vacuum chamber avoiding migration of atoms from the intermediate layer into an outer layer of the coating on the intermediate layer, wherein the following steps are performed:
loading the vacuum chamber with at least one substrate,
closing and evacuating the vacuum chamber,
cleaning the substrate by introducing a gaseous reducing agent into the vacuum chamber,
removing the gaseous reducing agent,
applying an intermediate layer by vacuum arc deposition, wherein a substrate comprising the same material of the intermediate layer is introduced into the vacuum chamber,
applying a coating by vacuum arc deposition at a temperature of 150° C. to 400° C.,
wherein at least one metal taken from the group of ruthenium, iridium, titanium and mixtures thereof is introduced into the vacuum chamber and oxygen is supplied throughout the coating period, and
in a last step the vacuum chamber is re-flooded and the substrate comprising the substrate coating is removed from the chamber,
wherein the above steps and transitions from one step to the next are performed under vacuum which is set by means of a protective gas,
wherein at least 99% of the intermediate layer is kept free of constituents initially contained in the substrate, and
wherein at least 99% of the intermediate layer is kept free of non-oxidised metals; and
wherein the substrate coating, consisting of the intermediate layer and the coating applied to it, has a layer thickness of 1 to 30 μm.

9. The substrate according to claim 8 , wherein the substrate coating is completely kept free of constituents initially contained in the substrate and the coating applied onto the intermediate layer is completely kept free of non-oxidised metals.

10. The substrate according to claim 8 , wherein the substrate is selected from a group comprising stainless steel and elements of the nickel group as well as coated stainless steel from elements of the nickel group.

11. The substrate according to claim 8 , wherein the coating applied onto the intermediate layer consists of ruthenium dioxide.

12. The substrate according to claim 8 , wherein the coating applied onto the intermediate layer is made up of a mixture of the metal oxides of ruthenium dioxide:iridium dioxide:titanium dioxide.

13. The substrate according to claim 8 , wherein the intermediate layer features uneven areas on its surface.

14. The substrate according to claim 8 , wherein the coating applied onto the intermediate layer features uneven areas on its surface.

Assignees

• Dulle Karl Heinz
• Funck Frank
• Hoormann Dirk
• Oelmann Stefan
• Woltering Peter
• Schmitt Carsten
• Hofmann Philipp
• Baeumer Ulf Steffen
• Thyssenkrupp Ind Solutions Ag

Inventors

• Dulle Karl-Heinz
• Funck Frank
• Hoormann Dirk
• Oelmann Stefan
• Woltering Peter
• Schmitt Carsten
• Hofmann Philipp
• Baeumer Ulf-Steffen

Classifications

• C23C14/16

  on metallic substrates or on substrates of boron or silicon · CPC title

• B01J37/341

  making use of electric or magnetic fields, wave energy or particle radiation (use of flames, plasma or lasers B01J37/349) · CPC title

• B01J37/14

  with gases containing free oxygen · CPC title

• B01J23/462

  Ruthenium · CPC title

• B01J23/468

  Iridium · CPC title