Base material processing apparatus and method of predicting meandering

Patent metadata

Field	Value
Publication number	US-10029493-B2
Application number	US-201715657790-A
Country	US
Kind code	B2
Filing date	Jul 24, 2017
Priority date	Jul 25, 2016
Publication date	Jul 24, 2018
Grant date	Jul 24, 2018

Abstract

A base material processing apparatus detects the amount of widthwise misregistration of a base material in each detection position (Po, and Pa to Pd) lying on a transport path, and then calculates a difference between a detection value in the reference position (Po) and a detection value in each of the remaining detection positions (Pa to Pd) as a meandering amount. Subsequently, the base material processing apparatus determines coefficients obtained when a variation with time in each meandering amount is applied to a predetermined model function, and thereafter calculates coefficients of the model function predicted as the meandering of the base material in each processing position (P1 to P4), based on the determined coefficients and a positional relationship between the reference position (Po), the remaining detection positions (Pa to Pd) and the processing positions (P1 to P4). This achieves the prediction of the meandering of the base material in the processing positions (P1 to P4) with accuracy without any detector disposed in the processing positions (P1 to P4).

First claim

What is claimed is:

1. A base material processing apparatus comprising:
a transport mechanism for transporting an elongated strip-shaped base material in a longitudinal direction thereof along a predetermined transport path;
a processing part for processing the base material in a predetermined processing position lying on said transport path;
a first detector for acquiring a variation with time in a first detection value indicative of the amount of widthwise misregistration of the base material in a first detection position lying on said transport path;
a second detector for acquiring a variation with time in a second detection value indicative of the amount of widthwise misregistration of the base material in a second detection position lying on said transport path and downstream of said first detection position;
a detection position coefficient calculation part for determining a first coefficient obtained when each of the variation with time in said first detection value and the variation with time in said second detection value is applied to a predetermined model function; and
a processing position coefficient calculation part for calculating a second coefficient of said model function in said processing position, based on said first coefficient and a positional relationship between said first detection position, said second detection position and said processing position.

2. The base material processing apparatus according to claim 1 , wherein
said model function is a sine function, and
said first and second coefficients include an amplitude, a frequency and a phase of said sine function.

3. The base material processing apparatus according to claim 2 , wherein
said detection position coefficient calculation part determines said amplitude, said frequency and said phase through the use of a Fourier transform.

4. The base material processing apparatus according to claim 2 , wherein
said detection position coefficient calculation part determines said amplitude, said frequency and said phase through the use of a particle filter or a neural network.

5. The base material processing apparatus according to claim 1 , wherein
said processing position coefficient calculation part calculates said second coefficient of said model function in said processing position, on the assumption that the positions lying on said transport path are in proportional relation to said first coefficient.

6. The base aerial processing apparatus according to claim 1 , wherein
said processing part is an image recorder for ejecting ink toward the base material, and
the ejection position of said ink is corrected based on the model function with said second coefficient calculated by said processing position coefficient calculation part.

7. The base material processing apparatus according to claim 1 , wherein
said processing part is a meandering correction part for correcting the meandering of the base material, based on the model function with said second coefficient calculated by said processing position coefficient calculation part.

8. The base material processing apparatus according to claim 1 , wherein
each of said first and second detectors is an edge sensor for detecting the position of an edge of the base material.

9. A base material processing apparatus comprising:
a transport mechanism for transporting an elongated strip-shaped base material in a longitudinal direction thereof along a predetermined transport path;
a processing part for processing the base material in a predetermined processing position lying on said transport path;
a reference detector for acquiring a variation with time in a reference detection value indicative of the amount of widthwise misregistration of the base material in a reference position lying on said transport path;
a first detector for acquiring a variation with time in a first detection value indicative of the amount of widthwise misregistration of the base material in a first detection position lying on said transport path;
a second detector for acquiring a variation with time in a second detection value indicative of the amount of widthwise misregistration of the base material in a second detection position lying on said transport path and downstream of said first detection position;
a meandering amount calculation part for calculating a first meandering amount and a second meandering amount, said first meandering amount being a difference between said reference detection value and said first detection value, said second meandering amount being difference between said reference detection value and said second detection value;
a detection position coefficient calculation part for determining a first coefficient obtained when each of the variation with time in said first meandering amount and the variation with time in said second meandering amount is applied to a predetermined model function; and
a processing position coefficient calculation part for calculating a second coefficient of said model function in said processing position, based on said first coefficient and a positional relationship between said reference position, said first detection position, said second detection position and said processing position.

10. The base material processing apparatus according to claim 9 , wherein
said meandering amount calculation part calculates a difference between said reference detection value and said first detection value in the same portion of the base material as said first meandering amount, and calculates a difference between said reference detection value and said second detection value in the same portion of the base material as said second meandering amount.

11. The base material processing apparatus according to claim 10 , wherein
said model function is a sine function, and
said first and second coefficients include an amplitude, a frequency and a phase of said sine function.

12. The base material processing apparatus according to claim 9 , wherein
said model function is a. sine function, and
said first and second coefficients include an amplitude, a frequency and a phase of said sine function.

13. A method of predicting the meandering of an elongated strip-shaped base material in a predetermined processing position lying on a predetermined transport path while transporting the base material in a longitudinal direction thereof along the transport path, said method comprising the steps of:
a) acquiring a variation with time in a first detection value indicative of the amount of widthwise misregistration of the base material in a first detection position lying on said transport path, and acquiring a variation with time in a second detection value indicative of the amount of widthwise misregistration of the base material in a second detection position lying on said transport path and downstream of said first detection position;
b) determining a first coefficient obtained when each of the variation with time in said first detection value and the variation with time in said second detection value is applied to a predetermined model function; and
c) calculating a second coefficient of said model function in said processing position, based on said first coefficient and a positional relationship between said first detection position, said second detection position and said processing position.

14. The method according to claim 13 , further comprising the step of
e) correcting the meandering of the base material, based on the model function with said calculated second coefficient.

15. A method of predicting the meandering of an elongated strip-shaped base material in

Assignees

• Screen Holdings Co Ltd

Inventors

• Kamigiku Takashi
• Yoshida Mitsuhiro

Classifications

• B65H2801/15

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