Conductor and method of manufacturing the same

Patent metadata

Field	Value
Publication number	US-10026523-B2
Application number	US-201514685964-A
Country	US
Kind code	B2
Filing date	Apr 14, 2015
Priority date	Nov 8, 2012
Publication date	Jul 17, 2018
Grant date	Jul 17, 2018

Abstract

A conductor includes: a transparent conductive film which is formed on a transparent substrate and includes a silver nanowire; and a metal film of which at least a portion is formed to overlap the transparent conductive film, in which a portion in which the transparent conductive film and the metal film overlap each other includes a buffer film which has adhesion to each of the transparent conductive film and the metal film and does not impede conduction between the transparent conductive film and the metal film. Preferably, the buffer film is, for example, an ITO film, and at this time, an upper surface of the transparent conductive film is a reverse-sputtered surface.

First claim

What is claimed is:

1. A conductor of an input device for an input display device, the conductor having an input display region and a non-display region, the conductor comprising:
a substrate; and
a patterned transparent conductive film formed on the substrate in the input display region and the non-display region, the transparent conductive film including a silver nanowire,
wherein the non-display region of the conductor further comprises:
a metal film formed over the transparent conductive film such that at least a portion thereof overlaps the transparent conductive film formed in the non-display region; and
a buffer film made of a transparent metal oxide, provided between the transparent conductive film and the metal film, thereby forming a wiring portion having the metal film, the buffer film, and the transparent conductive film in the non-display region, the buffer film having adhesion to each of the transparent conductive film and the metal film, and not impeding conductivity between the transparent conductive film and the metal film,

and wherein the input display region of the conductor comprises:
at least one transparent electrode which is the patterned transparent conductive film disposed in the input display region without the buffer film formed thereon.

2. The conductor according to claim 1 , wherein the transparent metal oxide is ITO.

3. The conductor according to claim 1 , wherein an upper surface of the transparent conductive film is a reverse-sputtered surface, and the buffer film is formed on the reverse-sputtered surface.

4. The conductor according to claim 1 , wherein the metal film is formed of Cu.

5. A method of manufacturing a conductor of an input device for an input display, the conductor having an input display region and a non-display region, the method comprising:
providing a substrate having a transparent conductive film including a silver nanowire formed thereon;
forming a buffer film made of a transparent metal oxide on the transparent conductive film;
forming a metal film on the buffer film formed on the transparent conductive film; and
patterning the metal film, the buffer film, and the transparent conductive film, thereby providing in the input display region at least one transparent electrode formed of the transparent conductive film without the buffer film formed thereon, and providing in the non-display region a wiring portion formed of the transparent conductive film, the metal film, and the buffer film interposed therebetween,
wherein the buffer film having adhesion to each of the transparent conductive film and the metal film, and not impeding conductivity between the transparent conductive film and the metal film.

6. The method of manufacturing a conductor according to claim 5 , wherein the transparent metal oxide is formed of ITO.

7. The method of manufacturing a conductor according to claim 5 , the patterning comprising:
performing reverse sputtering on an upper surface of the transparent conductive film, the buffer film being formed on the upper surface.

Assignees

• Alps Electric Co Ltd

Inventors

• Abe Yui
• Taguchi Yoshihiro
• Bito Mitsuo
• Asabe Yoshiyuki
• Kitamura Yasuyuki
• Yamai Tomoyuki
• Oguma Koji
• Oba Tomofumi

Classifications

• H05K1/09

  Use of materials for the {conductive, e.g. } metallic pattern · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• H05K2201/0326

  Inorganic, non-metallic conductor, e.g. indium-tin oxide [ITO] · CPC title

• Y10T428/31663

  As siloxane, silicone or silane · CPC title

• H05K2201/10128

  Display · CPC title