Smart selection and/or weighting of parameters for lithographic process simulation

Patent metadata

Field	Value
Publication number	US-10025198-B2
Application number	US-61500409-A
Country	US
Kind code	B2
Filing date	Nov 9, 2009
Priority date	Jul 7, 2008
Publication date	Jul 17, 2018
Grant date	Jul 17, 2018

Abstract

The present invention generally relates to simulating a lithographic process, and more particularly to methods for smart selection and smart weighting when selecting parameters and/or kernels used in aerial image computation. According to one aspect, advantages in simulation throughput and/or accuracy can be achieved by selecting TCC kernels more intelligently, allowing highly accurate aerial images to be simulated using a relatively fewer number of TCC kernels than in the state of the art. In other words, the present invention allows for aerial images to be simulated with the same or better accuracy using much less simulation throughput than required in the prior art, all else being equal.

First claim

What is claimed is:

1. A method comprising:
identifying a software model for simulating a lithographic manufacturing process, the software model comprising a finite number of mathematical terms added together, which when combined with a mathematical representation of a mask, generate a result that simulates performance of the lithographic manufacturing process using the mask, wherein each of at least two of the mathematical terms comprises a same or different variable;
identifying a geometric or frequency characteristic of a desired mask layout;
selecting, by a hardware computer, a subset of the finite number of terms of the software model based on the identified characteristic of the desired mask layout; and
using the software model with only the selected subset of the plurality of terms to perform a computer simulation of the performance of the lithographic manufacturing process, where an output of the software model is used to design, control and/or modify an aspect of the lithographic manufacturing process and/or of a physical object or apparatus for use in the lithographic manufacturing process.

2. A method according to claim 1 , wherein the selecting step includes:
preparing a mathematical representation of the desired mask layout based on the identified characteristic;
for each of the plurality of terms, calculating an aerial image intensity contribution of the each term in response to the mathematical representation of the desired mask layout based on the identified characteristic; and
selecting the subset of the plurality of terms based on the respective calculated aerial intensity contributions.

3. A method according to claim 1 , wherein the selecting step includes:
preparing a mathematical representation of the desired mask layout based on the identified characteristic;
forming a new set of terms corresponding to the plurality of terms, wherein the new set of terms are weighted by the mathematical representation of the desired mask layout based on the identified characteristic; and
selecting the subset of the plurality of terms based on the corresponding new terms.

4. A method according to claim 1 , wherein the selecting step includes:
preparing a mathematical representation of the desired mask layout based on the identified characteristic;
for each of the plurality of terms, calculating a value using the mathematical representation of the desired mask layout based on the identified characteristic; and
ranking the plurality of terms based on the calculated value.

5. A method according to claim 1 , wherein each of the plurality of terms have an associated magnitude, the method further comprising selecting a second subset of the plurality of terms based on the associated magnitudes, and using the selected second subset in addition to the selected subset to simulate the performance of the lithographic manufacturing process.

6. A method according to claim 1 , wherein the plurality of terms represent a perturbation between the lithographic manufacturing process and a different lithographic manufacturing process.

7. A method according to claim 1 , wherein the plurality of terms is formed according to Hopkins theory.

8. A method according to claim 1 , wherein the plurality of terms comprise Transmission Cross Coefficients (TCCs).

9. A computer program product comprising a non-transitory computer-readable medium having instructions recorded therein, which when executed by a hardware computer, cause the computer to perform at least:
identification of a software model for simulating a lithographic manufacturing process, the software model comprising a finite number of mathematical terms added together, which when combined with a mathematical representation of a mask, generate a result that simulates performance of the lithographic manufacturing process using the mask, wherein each of at least two of the mathematical terms comprises a same or different variable;
identification of a geometric or frequency characteristic of a desired mask layout;
selection of a subset of the finite number terms of the software model based on the identified characteristic of the desired mask layout; and
use of the software model with only the selected subset of the plurality of terms to perform a computer simulation of the performance of the lithographic manufacturing process, where an output of the software model is used to design, control and/or modify an aspect of the lithographic manufacturing process and/or of a physical object or apparatus for use in the lithographic manufacturing process.

10. A computer program product according to claim 9 , wherein the selecting step includes:
preparing a mathematical representation of the desired mask layout based on the identified characteristic;
for each of the plurality of terms, calculating an aerial image intensity contribution of the each term in response to the mathematical representation of the desired mask layout based on the identified characteristic; and
selecting the subset of the plurality of terms based on the respective calculated aerial intensity contributions.

11. A computer program product according to claim 9 , wherein the selecting step includes:
preparing a mathematical representation of the desired mask layout based on the identified characteristic;
forming a new set of terms corresponding to the plurality of terms, wherein the new set of terms are weighted by the mathematical representation of the desired mask layout based on the identified characteristic; and
selecting the subset of the plurality of terms based on the corresponding new terms.

12. A computer program product according to claim 9 , wherein the selecting step includes:
preparing a mathematical representation of the desired mask layout based on the identified characteristic;
for each of the plurality of terms, calculating a value using the mathematical representation of the desired mask layout based on the identified characteristic; and
ranking the plurality of terms based on the calculated value.

13. A computer program product according to claim 9 , wherein each of the plurality of terms have an associated magnitude, the method further comprising selecting a second subset of the plurality of terms based on the associated magnitudes, and using the selected second subset in addition to the selected subset to simulate the performance of the lithographic manufacturing process.

14. A computer program product according to claim 9 , wherein the plurality of terms represent a perturbation between two different lithographic manufacturing processes.

15. A computer program product according to claim 9 , wherein the plurality of terms is formed according to Hopkins theory.

16. A computer program product according to claim 9 , wherein the plurality of terms comprise Transmission Cross Coefficients (TCCs).

17. A method, comprising:
identifying a software model of a lithographic manufacturing process, the software model comprising a series of N mathematical terms, each of the terms having an associated magnitude and each of at least two of the mathematical terms comprising a same or different variable;
determining, by a hardware computer, a contribution of each of the N mathematical terms to an aerial image formed by the lithographic manufacturing process using a mask layout;
ranking the N mathematical terms, wherein the ranking comprises the determined contributions; and
selecting a subset of the N mathematical terms based on the ranking of the determined contributions, the selected subset being used to perform computer simulation of performance

Assignees

• Cao Yu
• Shao Wenjin
• Feng Hanying
• Du Fei
• Snajdr Martin
• Asml Netherlands Bv

Inventors

• Cao Yu
• Shao Wenjin
• Feng Hanying
• Du Fei
• Snajdr Martin

Classifications

• G03F7/70666

  Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system · CPC title

• G03F7/705 Primary

  Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions · CPC title