Hard material, sintered material, tool including sintered material, manufacturing method of hard material, and manufacturing method of sintered material

US10023499B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10023499-B2
Application numberUS-201515502434-A
CountryUS
Kind codeB2
Filing dateAug 4, 2015
Priority dateAug 8, 2014
Publication dateJul 17, 2018
Grant dateJul 17, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A hard material which, when used as a material of a sintered material, makes it possible to obtain a sintered material with excellent abrasion resistance, a sintered material, a cutting tool including the sintered material, a method for manufacturing the hard material and a method for manufacturing the sintered material are provided. The hard material contains aluminum, nitrogen, and at least one element selected from the group consisting of titanium, chromium, and silicon, and has a cubic rock salt structure.

First claim

Opening claim text (preview).

The invention claimed is: 1. A hard material comprising: aluminum; nitrogen; and at least one selected from the group consisting of titanium, chromium, and silicon, and having a cubic rock salt structure, wherein said hard material contains greater than or equal to 0.1% by mass and less than or equal to 3.0% by mass of copper and said hard material contains a total of greater than or equal to 0.5% by mass and less than or equal to 5.0% by mass of a first metal containing at least one selected from the group consisting of iron, cobalt and nickel. 2. A sintered material comprising the hard material according to claim 1 . 3. The sintered material according to claim 2 , further comprising at least one compound formed of at least one transition metal element selected from the group consisting of elements in Group 4, elements in Group 5, and elements in Group 6 of the periodic table, and either one or both of carbon and nitrogen. 4. The sintered material according to claim 2 , further comprising greater than or equal to 10% by mass and less than or equal to 70% by mass of cubic boron nitride. 5. A cutting tool comprising the sintered material according to claim 2 . 6. A method for manufacturing the hard material according to claim 1 , comprising the steps of: preparing a target containing aluminum, at least one selected from the group consisting of titanium, chromium, and silicon, at least one selected from the group consisting of iron, cobalt and nickel and copper as constituent elements; and treating said target in an argon and nitrogen atmosphere by a physical vapor deposition method to gas-phase synthesize a thin film containing said hard material on a substrate. 7. A method for manufacturing the hard material according to claim 1 , comprising the steps of: preparing a first grain group containing at least either of aluminum grains and aluminum nitride grains, at least one selected from the group consisting of chromium grains, titanium grains, silicon grains and grains of nitrides of these elements, at least one selected from the group consisting of iron, cobalt and nickel, and copper; and treating said first grain group by a static pressure synthetic method or a shock compression method to produce said hard material. 8. A method for manufacturing the sintered material according to claim 2 , comprising the steps of: preparing a hard material; preparing a second grain group containing said hard material; and sintering said second grain group to produce a sintered material, wherein the step of preparing said hard material includes a step of preparing a target containing aluminum, at least one selected from the group consisting of titanium, chromium, and silicon, at least one selected from the group consisting of iron, cobalt and nickel, and copper as constituent elements, and a step of treating said target in an argon and nitrogen atmosphere by a physical vapor deposition method to gas-phase synthesize a thin film containing said hard material on a substrate. 9. A method for manufacturing the sintered material according to claim 2 , comprising the steps of: preparing a hard material; preparing a second grain group containing said hard material; and sintering said second grain group to produce a sintered material, wherein the step of preparing said hard material includes a step of preparing a first grain group containing at least either of aluminum grains and aluminum nitride grains, at least one selected from the group consisting of chromium grains, titanium grains, silicon grains and grains of nitrides of these elements, at least one selected from the group consisting of iron, cobalt and nickel, and copper.

Assignees

Inventors

Classifications

  • Refractory metals · CPC title

  • Metallic constituents or additives not added as binding phase · CPC title

  • based on aluminium nitride · CPC title

  • Composition of the cutting inserts · CPC title

  • based on cubic boron nitrides {or Wurtzitic boron nitrides, including crystal structure transformation of powder} · CPC title

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What does patent US10023499B2 cover?
A hard material which, when used as a material of a sintered material, makes it possible to obtain a sintered material with excellent abrasion resistance, a sintered material, a cutting tool including the sintered material, a method for manufacturing the hard material and a method for manufacturing the sintered material are provided. The hard material contains aluminum, nitrogen, and at least o…
Who is the assignee on this patent?
Sumitomo Electric Industries
What technology area does this patent fall under?
Primary CPC classification C04B35/5831. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 17 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).