Magnetic field compensation in a linear accelerator

US10021774B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10021774-B2
Application numberUS-201715450666-A
CountryUS
Kind codeB2
Filing dateMar 6, 2017
Priority dateMar 9, 2016
Publication dateJul 10, 2018
Grant dateJul 10, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system has a linear accelerator, ion pump and a compensating magnet. The ion pump includes an ion pump magnet position, an ion pump magnet shape, an ion pump magnet orientation, and an ion pump magnet magnetic field profile. The compensating magnet has a position, a shape, an orientation, and a magnetic field profile, where at least one of the position, shape, orientation, and magnetic field profile of the compensating magnet reduce at least one component of a magnetic field in the linear accelerator resulting from the ion pump magnet.

First claim

Opening claim text (preview).

What is claimed is: 1. A system comprising: a linear accelerator having a central axis; an ion pump including an ion pump magnet having an ion pump magnet position, an ion pump magnet shape, an ion pump magnet orientation, and an ion pump magnet magnetic field profile; and a compensating magnet having a position, a shape, an orientation, and a magnetic field profile, wherein at least one of the position, shape, orientation, and magnetic field profile reduce at least one component of a magnetic field in the linear accelerator resulting from the ion pump magnet, wherein an ion pump magnet polarity and a compensating magnet polarity are substantially perpendicular to the central axis. 2. The system of claim 1 , wherein at least one of the position, shape, orientation, and magnetic field profile of the compensating magnet is substantially similar to at least one of the ion pump magnet position, ion pump magnet shape, ion pump magnet orientation, and ion pump magnet magnetic field profile of the ion pump. 3. The system of claim 1 , wherein the ion pump magnet and the compensating magnet each have a C-shape, each of the C-shapes having an opening, and wherein the openings of the C-shapes face each other. 4. The system of claim 1 , wherein the linear accelerator has an electron beam path and the reduction of the at least one component of a magnetic field in the linear accelerator reduces the magnetic field along the electron beam path. 5. The system of claim 1 , wherein at least one of the position, shape, orientation, and magnetic field profile of the compensating magnet are configured to reduce a gradient of the magnetic field in the linear accelerator. 6. The system of claim 1 , wherein the compensating magnet is a current carrying coil. 7. The system of claim 1 , wherein the orientation of the compensating magnet is such that the magnetic field due to the ion pump magnet is substantially canceled in at least one location in the linear accelerator. 8. The system of claim 1 , wherein the linear accelerator has an electron beam path and the orientation of the compensating magnet is such that the magnetic field due to the ion pump magnet is substantially canceled along the electron beam path. 9. The system of claim 1 , wherein at least one of the position, shape, orientation, and magnetic field profile of the compensating magnet and at least one of the ion pump magnet position, ion pump magnet shape, ion pump magnet orientation, and ion pump magnet magnetic field profile are selected to cause the least reduction in a beam quality of the linear accelerator. 10. The system of claim 1 , wherein at least one of the ion pump magnet and the compensating magnet are located closer to a linear accelerator target than to a source of charged particles in the linear accelerator. 11. The system of claim 1 , wherein the ion pump magnet orientation and the orientation of the compensating magnet are such that the ion pump magnet polarity and the compensating magnet polarity are substantially opposite to one another. 12. The system of claim 1 , wherein the ion pump magnet and the compensating magnet are oriented at approximately 45 degrees relative to the central axis. 13. The system of claim 1 , wherein at least one of the ion pump magnet and the compensating magnet further comprising a yoke. 14. The system of claim 13 , wherein at least one of the ion pump magnet and the compensating magnet further comprising two permanent magnets, wherein the yoke connects the two permanent magnets.

Assignees

Inventors

Classifications

  • Linear accelerators · CPC title

  • Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps · CPC title

  • H05H7/04Primary

    Magnet systems {, e.g. undulators, wigglers (free-electron laser H01S3/0903)}; Energisation thereof · CPC title

  • Vacuum chambers (H05H5/03 takes precedence) · CPC title

  • Lepton LINACS · CPC title

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What does patent US10021774B2 cover?
A system has a linear accelerator, ion pump and a compensating magnet. The ion pump includes an ion pump magnet position, an ion pump magnet shape, an ion pump magnet orientation, and an ion pump magnet magnetic field profile. The compensating magnet has a position, a shape, an orientation, and a magnetic field profile, where at least one of the position, shape, orientation, and magnetic field …
Who is the assignee on this patent?
Viewray Tech Inc
What technology area does this patent fall under?
Primary CPC classification H05H7/04. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 10 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).