Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device

US10017696B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10017696-B2
Application numberUS-201515118039-A
CountryUS
Kind codeB2
Filing dateFeb 4, 2015
Priority dateFeb 13, 2014
Publication dateJul 10, 2018
Grant dateJul 10, 2018

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Abstract

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A thermosetting composition with a photo-alignment property includes a copolymer containing a photo-alignment constitutional unit represented by the following formula (1) and a thermal cross-linking constitutional unit represented by the following formula (2). Here, in the formula (1), X represents a photo-alignment group, L 1 represents a divalent linking group or a single bond, R 1 represents a hydrogen atom or a monovalent organic group, and k represents 1 to 5; in the formula (2), Y represents a thermal cross-linking group, L 2 represents a divalent linking group or a single bond, R 2 represents a hydrogen atom or a monovalent organic group, and 1 represents 1 to 5.

First claim

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The invention claimed is: 1. A thermosetting composition with a photo-alignment property, comprising a copolymer containing a photo-alignment constitutional unit represented by the following formula (1) and a thermal cross-linking constitutional unit represented by the following formula (2): in the formula (1), X represents a photo-alignment group, L 1 represents a divalent linking group or a single bond, R 1 represents a hydrogen atom or a monovalent organic group, and k represents 1 to 5; in the formula (2), Y represents a thermal cross-linking group, L 2 represents a divalent linking group or a single bond, R 2 represents a hydrogen atom or a monovalent organic group, and 1 represents 1 to 5, and wherein the thermal cross-linking group of the thermal cross-linking constitutional unit is at least one selected from the group consisting of an aliphatic hydroxy group, a carboxy group, a mercapto group, a glycidyl group, an amide group, a phenolic hydroxy group of which ortho-position is substituted with a hydroxymethyl group or an alkoxymethyl group, an N-alkoxymethyl group, and an N-hydroxymethyl group. 2. The thermosetting composition with a photo-alignment property according to claim 1 , further comprising a cross-linking agent for bonding to the thermal cross-linking group of the thermal cross-linking constitutional unit. 3. The thermosetting composition with a photo-alignment property according to claim 1 , wherein the thermal cross-linking constitutional unit includes a self-cross-linkable cross-linking group as the thermal cross-linking group. 4. The thermosetting composition with a photo-alignment property according to claim 1 , wherein the copolymer further contains a second thermal cross-linking constitutional unit including a self-cross-linkable second thermal cross-linking group. 5. The thermosetting composition with a photo-alignment property according to claim 1 , wherein the photo-alignment group is a functional group for causing a photo-dimerization reaction or a photo-isomerization reaction. 6. The thermosetting composition with a photo-alignment property according to claim 1 , wherein the photo-alignment group is a cinnamoyl group. 7. The thermosetting composition with a photo-alignment property according to claim 1 , wherein all constitutional units of the copolymer contains a styrene unit. 8. An alignment layer comprising a copolymer including a photo-dimerization structure of a photo-alignment group of a photo-alignment constitutional unit represented by the following formula (1) and a cross-linking structure of a thermal cross-linking group of a thermal cross-linking constitutional unit represented by the following formula (2): in the formula (1), X represents a photo-alignment group, L 1 represents a divalent linking group or a single bond, R 1 represents a hydrogen atom or a monovalent organic group, and k represents 1 to 5; in the formula (2), Y represents the thermal cross-linking group, L 2 represents a divalent linking group or a single bond, R 2 represents a hydrogen atom or a monovalent organic group, and 1 represents 1 to 5, and wherein the thermal cross-linking group of the thermal cross-linking constitutional unit is at least one selected from the group consisting of an aliphatic hydroxy group, a carboxy group, a mercapto group, a glycidyl group, an amide group, a phenolic hydroxy group of which ortho-position is substituted with a hydroxymethyl group or an alkoxymethyl group, an N-alkoxymethyl group, and an N-hydroxymethyl group. 9. The alignment layer according to claim 8 , wherein the photo-dimerization structure is a photo-dimerization structure of a cinnamoyl group. 10. An alignment layer comprising a copolymer including a photo-isomerization structure of a photo-alignment group of a photo-alignment constitutional unit represented by the following formula (1) and a cross-linking structure of a thermal cross-linking group of a thermal cross-linking constitutional unit represented by the following formula (2): in the formula (1), X represents a photo-alignment group, L 1 represents a divalent linking group or a single bond, R 1 represents a hydrogen atom or a monovalent organic group, and k represents 1 to 5; in the formula (2), Y represents the thermal cross-linking group, L 2 represents a divalent linking group or a single bond, R 2 represents a hydrogen atom or a monovalent organic group, and 1 represents 1 to 5, and wherein the thermal cross-linking group of the thermal cross-linking constitutional unit is at least one selected from the group consisting of an aliphatic hydroxy group, a carboxy group, a mercapto group, a glycidyl group, an amide group, a phenolic hydroxy group of which ortho-position is substituted with a hydroxymethyl group or an alkoxymethyl group, an N-alkoxymethyl group, and an N-hydroxymethyl group. 11. The alignment layer according to claim 10 , wherein the photo-isomerization structure is a photo-isomerization structure of a cinnamoyl group. 12. The alignment layer according to claim 8 , wherein the cross-linking structure is a cross-linking structure obtained by bonding the thermal cross-linking group of the thermal cross-linking constitutional unit to a cross-linking agent. 13. The alignment layer according to claim 8 , wherein the cross-linking structure is a cross-linking structure of a self-cross-linkable cross-linking group as the thermal cross-linking group in the thermal cross-linking constitutional unit. 14. A substrate with an alignment layer comprising a substrate, and the alignment layer disposed on the substrate and formed from the thermosetting composition with a photo-alignment property according to claim 1 . 15. A substrate with an alignment layer comprising a substrate, and the alignment layer according to claim 8 , disposed on the substrate. 16. A retardation plate comprising a substrate, the alignment layer according to claim 8 , disposed on the substrate, and a retardation layer disposed on the alignment layer. 17. A device comprising the alignment layer according to claim 8 .

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What does patent US10017696B2 cover?
A thermosetting composition with a photo-alignment property includes a copolymer containing a photo-alignment constitutional unit represented by the following formula (1) and a thermal cross-linking constitutional unit represented by the following formula (2). Here, in the formula (1), X represents a photo-alignment group, L 1 represents a divalent linking group or a single bond, R 1 represen…
Who is the assignee on this patent?
Dainippon Printing Co Ltd
What technology area does this patent fall under?
Primary CPC classification C08F212/21. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 10 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).