Modified phenolic resin, method for producing modified phenolic resin, modified epoxy resin, method for producing modified epoxy resin, curable resin composition, cured product of same, and printed wiring board

US10017604B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10017604-B2
Application numberUS-201414784771-A
CountryUS
Kind codeB2
Filing dateFeb 27, 2014
Priority dateApr 19, 2013
Publication dateJul 10, 2018
Grant dateJul 10, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a modified epoxy resin and a modified epoxy resin whose cured products exhibit good heat resistance and dielectric properties, methods for producing these, a curable resin composition, a cured product of the curable resin composition, and a printed wiring substrate. A modified phenolic resin comprises a phenolic resin structure (A), wherein at least one aromatic nucleus (a) in the phenolic resin structure (A) has, as a substituent, a structural segment (1) represented by structural formula (1) below: In the formula, Ar each independently represent a phenyl group, a naphthyl group, or a structural segment having, on an aromatic nucleus of a phenyl or naphthyl group, at least one substituent selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a halogen atom, a phenyl group, and an aralkyl group.

First claim

Opening claim text (preview).

The invention claimed is: 1. A modified phenolic resin comprising a phenolic resin structure (A), wherein at least one aromatic nucleus (a) in the phenolic resin structure (A) has, as a substituent, a structural segment (1) represented by structural formula (1) below: (In the formula, Ar each independently represent a phenyl group, a naphthyl group, or a structural segment having, on an aromatic nucleus of a phenyl or naphthyl group, at least one substituent selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a halogen atom, a phenyl group, and an aralkyl group). 2. The modified phenolic resin according to claim 1 , wherein the phenolic resin structure (A) is any one selected from a bisphenol-type resin structure (A1), a novolac-type phenolic resin structure (A2), an aralkyl-type phenolic resin structure (A3), a resin structure (A4) having phenolic skeletons connected through an alicyclic hydrocarbon group, and a resin structure (A5) that contains a structural segment represented by structural formula (2) below: [Chem. 2] -Ph-M-An-  (2) (In the formula, Ph represents a phenolic-hydroxyl-group-containing aromatic hydrocarbon group, M represents a divalent hydrocarbon group selected from a methylene group, an alkylidene group, and an aromatic-hydrocarbon-structure-containing methylene group, and An represents an alkoxy-group-containing fused polycyclic aromatic hydrocarbon group). 3. A method for producing a modified phenolic resin, comprising inducing a phenolic resin (I) to react with a compound (II) represented by structural formula (3) below: (In the formula, X represents a hydroxyl group or a halogen atom, and Ar each independently represent a phenyl group, a naphthyl group, or a structural segment having, on an aromatic nucleus of a phenyl or naphthyl group, at least one substituent selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a halogen atom, a phenyl group, and an aralkyl group), the reaction being conducted in such a manner that there is 0.1 to 2.0 mol of the compound (II) per mole of a phenolic hydroxyl group contained in the phenolic resin (I). 4. A modified phenolic resin obtained by the method according to claim 3 . 5. A modified epoxy resin comprising a polyglycidyl ether structure (B) of a phenolic resin, wherein at least one aromatic nucleus (a) in the polyglycidyl ether structure (B) of a phenolic resin has, as a substituent, a structural segment (1) represented by structural formula (1) below: (In the formula, Ar each independently represent a phenyl group, a naphthyl group, or a structural segment having, on an aromatic nucleus of a phenyl or naphthyl group, at least one substituent selected from the group consisting of an alkyl group having 1to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a halogen atom, a phenyl group, and an aralkyl group). 6. The modified epoxy resin according to claim 5 , wherein the polyglycidyl ether structure (B) of a phenolic resin is any one selected from a polyglycidyl ether structure (B1) of a bisphenol-type resin, a polyglycidyl ether structure (B2) of a novolac-type phenolic resin, a polyglycidyl ether structure (B3) of an aralkyl-type phenolic resin, a polyglycidyl ether structure (B4) of a resin having phenolic skeletons connected through an alicyclic hydrocarbon group, and a resin structure (B5) represented by structural formula (2) below: [Chem. 5] -Ph-M-An-  (2) (In the formula, Ph represents a glycidyl-ether-group-containing aromatic hydrocarbon group, M represents a divalent hydrocarbon group selected from a methylene group, an alkylidene group, and an aromatic-hydrocarbon-structure-containing methylene group, and An represents an alkoxy-group-containing fused polycyclic aromatic hydrocarbon group). 7. A method for producing a modified epoxy resin, comprising inducing a phenolic resin (I) to react with a compound (II) represented by structural formula (3) below: (In the formula, X represents a hydroxyl group or a halogen atom, and Ar each independently represent a phenyl group, a naphthyl group, or a structural segment having, on an aromatic nucleus of a phenyl or naphthyl group, at least one substituent selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a halogen atom, a phenyl group, and an aralkyl group), the reaction being conducted in such a manner that there is 0.1 to 2.0 mol of the compound (II) per mole of a phenolic hydroxyl group contained in the phenolic resin (I), and inducing the resulting modified phenolic resin to react with an epihalohydrin. 8. A modified epoxy resin obtained by the method according to claim 7 . 9. A curable resin composition comprising the modified phenolic resin according to claim 1 and a curing agent. 10. A curable resin composition comprising the modified epoxy resin according to claim 5 and a curing agent. 11. A cured product obtained by curing the curable resin composition according to claim 9 . 12. A printed wiring substrate obtained by impregnating a reinforcing substrate with a varnish composition containing the curable resin composition according to claim 9 and an organic solvent, placing a copper foil on the reinforcing substrate, and performing thermal press-bonding.

Assignees

Inventors

Classifications

  • C08G8/28Primary

    Chemically modified polycondensates · CPC title

  • Secondary treatment of printed circuits {(H05K3/1283 takes precedence; embedding circuits in grooves by pressure H05K3/107)} · CPC title

  • C08G61/02Primary

    Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes · CPC title

  • Use of materials for the {conductive, e.g. } metallic pattern · CPC title

  • from phenol-aldehyde condensates · CPC title

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What does patent US10017604B2 cover?
Provided are a modified epoxy resin and a modified epoxy resin whose cured products exhibit good heat resistance and dielectric properties, methods for producing these, a curable resin composition, a cured product of the curable resin composition, and a printed wiring substrate. A modified phenolic resin comprises a phenolic resin structure (A), wherein at least one aromatic nucleus (a) in the …
Who is the assignee on this patent?
Dainippon Ink & Chemicals
What technology area does this patent fall under?
Primary CPC classification C08G8/28. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 10 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).