Doped silica-titania glass having low expansivity and methods of making the same

Patent metadata

Field	Value
Publication number	US-10017413-B2
Application number	US-201514950374-A
Country	US
Kind code	B2
Filing date	Nov 24, 2015
Priority date	Nov 26, 2014
Publication date	Jul 10, 2018
Grant date	Jul 10, 2018

Abstract

A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.

First claim

What is claimed is:

1. A method of forming a doped silica-titania glass, the method comprising:
blending batch materials comprising silica, titania, and at least one dopant, the silica and titania having fine particle size, and the at least one dopant being one of a material with fine particle size and a dopant precursor gas, wherein the batch materials comprise titania having a particle size of between about 0.01 μm and about 0.10 μm;
heating the batch materials to form a glass melt;
consolidating the glass melt to form a glass article; and
annealing the glass article.

2. The method of claim 1 , wherein the at least one dopant is selected from the group consisting of chlorine, fluorine, and oxides containing boron, niobium, tantalum, aluminum, manganese, lithium, sodium, potassium, calcium, arsenic, antimony, tin, copper, zirconium, germanium and magnesium, and combinations thereof.

3. The method of claim 1 , wherein blending the batch materials comprises forming a slurry in the presence of a liquid.

4. The method of claim 1 , wherein the at least one dopant comprises a dopant precursor gas, and wherein the dopant precursor gas is a fluorine precursor gas.

5. The method of claim 4 , wherein the fluorine precursor is selected from the group consisting of F 2 , C 2 F 6 , CF 4 , SF 6 , SiF 4 and combinations thereof.

6. The method of claim 1 , further comprising heating the glass article to form a glass article substantially free of crystalline material.

7. The method of claim 1 , comprising consolidating the glass melt under vacuum.

8. The method of claim 1 , wherein consolidating the glass melt comprises exposing the glass melt to a steam-containing atmosphere.

9. The method of claim 1 , wherein annealing the glass article comprises holding the glass article at a temperature between about 600° C. and about 1000° C.

10. The method of claim 1 , wherein annealing the glass article comprises cooling the glass article at a rate of less than about 10° C. per hour.

11. The method of claim 1 , wherein the batch materials comprise:
between about 75 wt. % and about 91 wt. % silica;
between about 9.0 wt % and about 17 wt. % titania; and
between about 0.001 wt. % and about 10 wt. % of the at least one dopant.

Assignees

• Corning Inc

Inventors

• Annamalai Sezhian
• Duran Carlos Alberto
• Hrdina Kenneth Edward
• Moore Lisa Anne

Classifications

• C03C2201/42

  containing titanium · CPC title

• C03C2201/10

  containing boron (C03C2201/14 takes precedence) · CPC title

• C03B25/00

  Annealing glass products · CPC title

• C03C2201/30

  containing metals · CPC title

• C03B2201/12

  doped with fluorine (C03B2201/14 takes precedence) · CPC title