Gas injection device and assisting member

US10014200B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10014200-B2
Application numberUS-201415101085-A
CountryUS
Kind codeB2
Filing dateDec 12, 2014
Priority dateFeb 7, 2014
Publication dateJul 3, 2018
Grant dateJul 3, 2018

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A gas injection device a placement portion on which a first or second container is placed, an ejection portion which is placed on the placement portion and ejects a purge gas, and a sealing portion protruding from the placement portion so as to surround a periphery of the ejection portion. The ejection portion, with the purge gas being injected into an inlet of the second container, does not come in contact with the inlet. The sealing portion, with the purge gas being injected into an inlet of the FOUP, does not impede the contact between the ejection portion and the inlet.

First claim

Opening claim text (preview).

The invention claimed is: 1. A gas injection device configured to inject a purge gas into a first inlet provided on a first container, and configured to inject the purge gas into a second inlet provided on a second container, the second inlet on the second container having a diameter larger than that of the first inlet on the first container, the gas injection device comprising: a placement portion on which one of the first container and the second container is selectively placed; an ejection portion which is placed on the placement portion and ejects the purge gas; and a sealing portion protruding from the placement portion and surrounding a periphery of the ejection portion; wherein the ejection portion is configured to come in contact with the first inlet and seals the first inlet with the purge gas being injected into the first inlet; the ejection portion is configured to not come in contact with the second inlet with the purge gas being injected into the second inlet; the sealing portion, with the purge gas being injected into the second inlet, is configured to come in contact with the second inlet or a peripheral edge of the second inlet and seals the second inlet in cooperation with the placement portion; and the sealing portion is configured to not impede the contact between the ejection portion and the first inlet with the purge gas being injected into the first inlet. 2. The gas injection device according to claim 1 , wherein the sealing portion includes an elastic body. 3. The gas injection device according to claim 2 , wherein the sealing portion includes a plate-shaped elastic body, the sealing portion is configured to be tilted towards the ejection portion with the purge gas being injected into the second inlet, and includes a leading end portion configured to be positioned into the second inlet and to come in contact with the second inlet. 4. The gas injection device according to claim 1 , wherein the sealing portion is spaced away from the periphery of the ejection portion.

Assignees

Inventors

Classifications

  • characterised by movements or sequence of movements of transfer devices · CPC title

  • characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier · CPC title

  • characterised by atmosphere control · CPC title

  • Semiconductors · CPC title

  • Electricity · mapped topic

Patent family

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External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10014200B2 cover?
A gas injection device a placement portion on which a first or second container is placed, an ejection portion which is placed on the placement portion and ejects a purge gas, and a sealing portion protruding from the placement portion so as to surround a periphery of the ejection portion. The ejection portion, with the purge gas being injected into an inlet of the second container, does not co…
Who is the assignee on this patent?
Murata Machinery Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/1926. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 03 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).