System and method for measuring gaps using an opto-analytical device

US10012070B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10012070-B2
Application numberUS-201214424794-A
CountryUS
Kind codeB2
Filing dateAug 31, 2012
Priority dateAug 31, 2012
Publication dateJul 3, 2018
Grant dateJul 3, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In one embodiment, a method includes drilling a wellbore in a formation with a drilling tool. The method further includes receiving electromagnetic radiation using an opto-analytical device coupled to the drilling tool. The method also includes determining a distance between a portion of the drilling tool and the formation based on the received electromagnetic radiation.

First claim

Opening claim text (preview).

What is claimed is: 1. A method comprising: drilling a wellbore in a formation with a drilling tool; receiving electromagnetic radiation using an opto-analytical device coupled to the drilling tool near the end of the wellbore, the opto-analytical device configured to detect an intensity of the received electromagnetic radiation; and determining a distance between a portion of the drilling tool and the formation based on the intensity of the received electromagnetic radiation. 2. The method of claim 1 , further comprising determining an amount of bit whirl associated with the drilling tool based on the determined distance. 3. The method of claim 1 , further comprising determining an amount of bit walk associated with the drilling tool based on the determined distance. 4. The method of claim 1 , further comprising determining an amount of bit tilt associated with the drilling tool based on the determined distance. 5. The method of claim 4 , wherein determining an amount of bit tilt comprises: determining a first distance between a first portion of the drilling tool and the formation; determining a second distance between a second portion of the drilling tool and the formation; and comparing the first distance and the second distance. 6. The method of claim 1 , further comprising determining a depth of cut associated with the drilling tool based on the determined distance. 7. The method of claim 6 , wherein determining a depth of cut associated with the drilling tool based on the determined distance comprises: determining a first distance between the opto-analytical device and the formation; and comparing the first distance and a second distance between the opto-analytical device and a cutting element of the drilling tool. 8. The method of claim 1 , further comprising determining an amount of wear of a cutting element of the drilling tool based on the determined distance. 9. A downhole drilling system comprising: a downhole drilling tool configured to drill a wellbore in a formation with a drilling tool; and an opto-analytical device coupled to the drilling tool near the end of the wellbore and configured to: receive electromagnetic radiation; detect an intensity of the received electromagnetic radiation; and determine a distance between a portion of the drilling tool and the formation based on the intensity of the received electromagnetic radiation. 10. The system of claim 9 , wherein the opto-analytical device is further configured to determine an amount of bit whirl associated with the drilling tool based on the determined distance. 11. The system of claim 9 , wherein the opto-analytical device is further configured to determine an amount of bit walk associated with the drilling tool based on the determined distance. 12. The system of claim 9 , wherein the opto-analytical device is further configured to determine an amount of bit tilt associated with the drilling tool based on the determined distance. 13. The system of claim 12 , wherein the opto-analytical device configured to determine an amount of bit tilt is configured to: determine a first distance between a first portion of the drilling tool and the formation; determine a second distance between a second portion of the drilling tool and the formation; and compare the first distance and the second distance. 14. The system of claim 9 , wherein the opto-analytical device is further configured to determine a depth of cut associated with the drilling tool based on the determined distance. 15. The system of claim 14 , wherein the opto-analytical device configured to determine a depth of cut associated with the drilling tool based on the determined distance is configured to: determine a first distance between the opto-analytical device and the formation; and compare the first distance and a second distance between the opto-analytical device and a cutting element of the drilling tool. 16. The system of claim 9 , wherein the opto-analytical device is further configured to determine an amount of wear of a cutting element of the drilling tool based on the determined distance. 17. A drill bit comprising: a bit body; a rotational axis about which the bit body rotates; a plurality of blades disposed on the bit body to create a bit face; an opto-analytical device integrated with the bit body, the opto-analytical device configured to: receive electromagnetic radiation; detect an intensity of the received electromagnetic radiation; and determine a distance between a portion of the drill bit and a formation based on the intensity of the received electromagnetic radiation. 18. The drill bit of claim 17 , wherein the opto-analytical device is further configured to determine an amount of bit whirl associated with the drill bit based on the determined distance. 19. The drill bit of claim 17 , wherein the opto-analytical device is further configured to determine an amount of bit walk associated with the drill bit based on the determined distance. 20. The drill bit of claim 17 , wherein the opto-analytical device is further configured to determine an amount of bit tilt associated with the drill bit based on the determined distance. 21. The drill bit of claim 20 , wherein the opto-analytical device configured to determine an amount of bit tilt is configured to: determine a first distance between a first portion of the drill bit and the formation; determine a second distance between a second portion of the drill bit and the formation; and compare the first distance and the second distance. 22. The drill bit of claim 17 , wherein the opto-analytical device is further configured to determine a depth of cut associated with the drill bit based on the determined distance. 23. The drill bit of claim 22 , wherein the opto-analytical device configured to determine a depth of cut based on the determined distance is configured to: determine a first distance between the opto-analytical device and the formation; and compare the first distance and a second distance between the opto-analytical device and a cutting element of the drill bit. 24. The drill bit of claim 17 , wherein the opto-analytical device is further configured to determine an amount of wear of a cutting element of the drill bit based on the determined distance.

Assignees

Inventors

Classifications

  • using radiant means, e.g. acoustic, radioactive or electromagnetic · CPC title

  • using electromagnetic energy or detectors therefor · CPC title

  • of devices in the borehole (determining slope or direction of the borehole E21B47/022) · CPC title

  • Special methods or apparatus for drilling · CPC title

  • E21B12/02Primary

    Wear indicators · CPC title

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Frequently asked questions

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What does patent US10012070B2 cover?
In one embodiment, a method includes drilling a wellbore in a formation with a drilling tool. The method further includes receiving electromagnetic radiation using an opto-analytical device coupled to the drilling tool. The method also includes determining a distance between a portion of the drilling tool and the formation based on the received electromagnetic radiation.
Who is the assignee on this patent?
Pelletier Michael T, Freese Robert P, Weaver Gary E, and 2 more
What technology area does this patent fall under?
Primary CPC classification E21B12/02. Mapped technology areas include Fixed Constructions.
When was this patent published?
Publication date Tue Jul 03 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).