QCM sensor and method of manufacturing the same

US10006885B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10006885-B2
Application numberUS-201514612549-A
CountryUS
Kind codeB2
Filing dateFeb 3, 2015
Priority dateAug 10, 2012
Publication dateJun 26, 2018
Grant dateJun 26, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In a QCM sensor and a method of manufacturing the same, the QCM sensor includes: a quartz plate; and an electrode provided on one and the other principal surfaces of the quartz plate, in which the electrode is provided with a pattern having a contour line in a planar view of the electrode.

First claim

Opening claim text (preview).

What is claimed is: 1. A QCM sensor comprising: a quartz plate having a first surface and a second surface, the first surface and the second surface being facing each other, the first surface and the second surface being both flat; a first electrode provided on the first surface, where an entire portion of the first electrode having electrical conductivity; a second electrode provided on the second surface, where an entire portion of the second electrode having electrical conductivity; a first pattern formed in the first electrode, the first pattern having a first arcuate contour line in a planar view; and a second pattern formed in the second electrode, the second pattern having a second arcuate contour line in a planar view. 2. The QCM sensor according to claim 1 , wherein each of the first pattern and the second pattern is a slit. 3. The QCM sensor according to claim 2 , wherein a plurality of the slits are concentrically provided. 4. The QCM sensor according to claim 2 , wherein the slit formed in the first electrode has an arcuate shape concentric with a center of the first electrode, and the slit formed in the second electrode has an arcuate shape concentric with a center of the second electrode. 5. The QCM sensor according to claim 1 , wherein the pattern is a groove. 6. The QCM sensor according to claim 1 , wherein all portions of the first electrode are connected in a planar view, and all portions of the second electrode are connected in a planar view. 7. The QCM sensor according to claim 1 , wherein the electrode includes a first metal film, and a second metal film formed on the first metal film and having higher reactivity to a corrosive gas than a reactivity of the first metal film. 8. The QCM sensor according to claim 1 , wherein the first pattern and the second pattern have a same shape in the planar view. 9. The QCM sensor according to claim 1 , wherein each of the first pattern and the second pattern has an axis of symmetry. 10. The QCM sensor according to claim 9 , wherein the axis of symmetry of the first pattern is located in a plane of the first electrode, and the axis of symmetry of the second pattern is located in a plane of the second electrode. 11. A method of manufacturing a QCM sensor, the method comprising: forming a first electrode with a first contour line on a first surface of a quartz plate, the first surface being flat, where an entire portion of the first electrode having electrical conductivity; forming a second electrode with a second contour line on a second surface of the quarts plate, the second surface being facing the first surface and flat, where an entire portion of the second electrode having electrical conductivity; forming a first pattern in the first electrode, the first pattern having a first arcuate contour line in a planar view; and forming a second pattern in the second electrode, the second pattern having a second arcuate contour line in a planar view. 12. The method of manufacturing the QCM sensor according to claim 11 , the method further comprising: designing the QCM sensor having a predetermined sensitivity by adjusting a total sum of a length of the first contour line and a length of the second contour line and a total area of the first electrode and the second electrode. 13. The method of manufacturing the QCM sensor according to claim 12 , wherein, in the designing of the QCM sensor, the sensitivity is estimated from a ratio of the total sum of the lengths of the first contour line and the length of the first arcuate contour line to the total area of the first electrode and a ratio of the total sum of the length of the contour line and the length of the second arcuate contour line to the total area of the second electrode. 14. The method of manufacturing the QCM sensor according to claim 11 , wherein any one of a slit, and a groove is formed as the first pattern and the second pattern.

Assignees

Inventors

Classifications

  • Details {, e.g. general constructional or apparatus details} · CPC title

  • G01N29/022Primary

    Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices (microdevices per se B81B) · CPC title

  • Investigating resistance of materials to the weather, to corrosion, or to light · CPC title

  • Manufacturing circuit on or in base · CPC title

  • (Bio)chemical reactions, e.g. on biosensors · CPC title

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Frequently asked questions

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What does patent US10006885B2 cover?
In a QCM sensor and a method of manufacturing the same, the QCM sensor includes: a quartz plate; and an electrode provided on one and the other principal surfaces of the quartz plate, in which the electrode is provided with a pattern having a contour line in a planar view of the electrode.
Who is the assignee on this patent?
Fujitsu Ltd
What technology area does this patent fall under?
Primary CPC classification G01N29/022. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 26 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).