Electroplating bath and method for producing dark chromium layers

Patent metadata

Field	Value
Publication number	US-10006135-B2
Application number	US-201715483122-A
Country	US
Kind code	B2
Filing date	Apr 10, 2017
Priority date	May 3, 2011
Publication date	Jun 26, 2018
Grant date	Jun 26, 2018

Abstract

The invention relates to electroplating baths and methods for electrodepositing a dark chromium layer on a workpiece. The trivalent chromium electroplating baths comprise sulphur compounds and the methods for electrodepositing a dark chromium layer employ these trivalent chromium electroplating baths. The dark chromium deposits and workpieces carrying dark chromium deposits are suited for application for decorative purposes.

First claim

The invention claimed is:

1. An electroplating bath for deposition of a dark chromium layer on a workpiece, the electroplating bath comprising:
(A) trivalent chromium ions;
(B) carboxylate ions;
(C) at least one pH buffer substance; and
(D) at least one coloring agent comprising 2-[2-(2-Hydroxy-ethylsulfanyl)-ethylsulfanyl]-ethanol, and,
optionally, further comprising one or both of:
at least one coloring agent selected from sulphur containing compounds having the general Formula (I)

wherein
n, p, q are independently of each other integers from 0 to 4;
R 1 represents —H, —OH, —COOH, —CO—OCH 3 , —CO—OCH 2 —CH 3 , —(—O—CH 2 —CH 2 —) m —OH, —CH(—NH 2 )—COOH, —CH(—NH—CH 3 )—COOH, —CH(—N(—CH 3 ) 2 )—COOH, —CH(—NH 2 )—CO—OCH 3 , —CH(—NH 2 )—CO—OCH 2 —CH 3 , —CH(—NH 2 )—CH 2 —OH, —CH(—NH—CH 3 )—CH 2 —OH, —CH(—N(—CH 3 ) 2 )—CH 2 —OH, —SO 3 H;
m represents an integer from 5 to 15;
R 2 represents —H, —OH, —(CH 2 —) p —OH, —(CH 2 —) p —C(—NH 2 )═NH, —CH 2 —CH 2 —(—O—CH 2 —CH 2 —) m —OH, —R 5 , —(CH 2 —) q —COOH, —(CH 2 —) q —CO—OCH 3 , —(CH 2 —) q —CO—OCH 2 —CH 3 , —(CH 2 —) q —S—(CH 2 —) 2 —OH, —CS—CH 3 , —CS—CH 2 —CH 3 , —CS—CH 2 —CH 2 —CH 3 , —CN,

R 1 and R 2 together represent a linear chain structure in order to build one of the following ring structures including the central sulphur atom of Formula (I)

R 5 represents —H, —CH 3 , —CH 2 —CH 3 , —CH 2 —CH 2 —CH 3 , or CH 2 —CH 2 —CH 2 —CH 3 ;
R 6 , R 7 , R 8 , R 9 represent independently of each other —H, —NH 2 , —SH, —OH, —CH 3 , —CH 2 —CH 3 , —COOH, or —SO 3 H;
and at least one coloring agent selected from sulphur containing compounds having the general Formula (II)

wherein
═X represents ═O, or a free electron pair;
R 3 represents —R 5 , —CH═CH 2 , —CH 2 —CH═CH 2 , —CH═CH—CH 3 , CH 2 —CH 2 —CH═CH 2 , —CH 2 —CH═CH—CH 3 , —CH═CH—CH 2 —CH 3 , —C≡CH, —CH 2 —C≡CH, —C≡C—CH 3 , —CH 2 —CH 2 —C≡CH, —CH 2 —C≡C—CH 3 , —C≡C—CH 2 —CH 3 , —C(—NH 2 )═NH,

R 4 represents —R 5 , —OR 5 , —(CH 2 —) r —CH(—NH 2 )—COOH, —(CH 2 —) r —CH(—NH—CH 3 )—COOH, —(CH 2 —) r —CH(—N(—CH 3 ) 2 )—COOH, —(CH 2 —) r —CH(—NH 2 )—CO—OCH 3 , or —(CH 2 —) r —CH(—NH 2 )—CO—OCH 2 —CH 3 ;
r is an integer from 0 to 4;
R 3 and R 4 together represent a linear chain structure in order to build one of the following ring structures including the central sulphur atom of Formula (II)

R 10 represents —H, —CH 3 , —CH 2 —CH 3 , —CH 2 —CH 2 —SO 3 H;
or salts, tautomeric forms, betaine structures thereof; and

(E) ferrous ions.

2. The electroplating bath according to claim 1 , wherein the bath includes the at least one coloring agent selected from sulphur containing compounds having the general Formula (I), and the sulphur containing compounds having the general Formula (I) are selected from compounds wherein R 1 is not H if R 2 is H or R 2 is not H if R 1 is H.

3. The electroplating bath according to claim 1 , wherein the bath includes the at least one coloring agent selected from sulphur containing compounds having the general Formula (I), and the sulphur containing compounds having the general Formula (I) are selected from compounds wherein
R 1 is —OH, and
R 2 is selected from the group consisting of —(CH 2 —) p —OH and —(CH 2 —) q —S—(CH 2 —) 2 —OH, wherein q is 0, 1, 3, or 4.

4. The electroplating bath according to claim 1 , wherein the bath includes the at least one coloring agent selected from sulphur containing compounds having the general Formula (II), and the sulphur containing compounds having the general Formula (II) are selected from compounds wherein R 3 and R 4 together represent the linear chain structure in order to build one of the following ring structures including the central sulphur atom of Formula (II)

in which R 10 represents —H, —CH 3 , —CH 2 —CH 3 or —CH 2 —CH 2 —SO 3 H.

5. The electroplating bath according to claim 1 , wherein the bath includes the at least one coloring agent selected from sulphur containing compounds having the general Formula (I), and the coloring agent according to Formula (I) is a sulphur containing compound selected from:
(1) 2-(2-Hydroxy-ethylsulfanyl)-ethanol,
(2) Thiazolidine-2-carboxylic acid,
(3) Thiodiglycol ethoxylate,
(4) 2-Amino-3-ethylsulfanyl-propionic acid,
(5) 3-(3-Hydroxy-propylsulfanyl)-propan-1-ol,
(6) 2-Amino-3-carboxymethylsulfanyl-propionic acid,
(7) 2-Amino-4-methylsulfanyl-butan-1-ol,
(8) 2-Amino-4-methylsulfanyl-butyric acid,
(9) 2-Amino-4-ethylsulfanyl-butyric acid,
(10) 3-Carbamimidoylsulfanyl-propane-1-sulfonic acid,
(11) 3-Carbamimidoylsulfanyl-propionic acid,
(12) Thiomorpholine,
(14) 4,5-Dihydro-thiazol-2-ylamine,
(15) Thiocyanic acid.

6. The electroplating bath according to claim 1 , further comprising chloride ions or bromide ions.

7. The electroplating bath according to claim 1 , wherein the bath includes the at least one coloring agent selected from sulphur containing compounds having the general Formula (I), and the concentration of the coloring agent according to general Formula (I) ranges from 0.01 g/L to 100 g/L.

8. The electroplating bath according to claim 1 , wherein the bath includes the at least one coloring agent selected from sulphur containing compounds having the general Formula (II), and the concentration of the coloring agent according to general Formula (II) ranges from 0.01 g/L to 100 g/L.

9. The electroplating bath according to claim 1 , wherein the concentration of the ferrous ions ranges from 40 mg/L to 280 mg/L.

10. The electroplating bath according to claim 1 , wherein the bath is free of compounds containing phosphorus.

11. The electroplating bath according to claim 1 , wherein the bath includes both the at least one coloring agent selected from sulphur containing compounds having the general Formula (I) and the at least one coloring agent selected from sulphur containing compounds having the general Formula (II).

12. The electroplating bath according to claim 11 , wherein the sulphur containing compounds having the general Formula (I) are selected from compounds wherein R 1 is not H if R 2 is H or R 2 is not H if R 1 is H.

13. The electroplating bath according to claim 11 , wherein the sulphur containing compounds having the general Formula (I) are selected from compounds wherein
R 1 is —OH, and
R

Assignees

• Atotech Deutschland Gmbh
• Atotech Deutschland LLP

Inventors

• Schulz Klaus-Dieter
• Wachter Philipp
• Hartmann Philip

Classifications

• C25D3/06 Primary

  from solutions of trivalent chromium · CPC title

• C25D3/08

  Deposition of black chromium {, e.g. hexavalent chromium, CrVI} · CPC title

• C25D3/10 Primary

  characterised by the organic bath constituents used · CPC title