Stamps and methods of forming a pattern on a substrate

US10005308B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10005308-B2
Application numberUS-201514669612-A
CountryUS
Kind codeB2
Filing dateMar 26, 2015
Priority dateFeb 5, 2008
Publication dateJun 26, 2018
Grant dateJun 26, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.

First claim

Opening claim text (preview).

What is claimed is: 1. A stamp, comprising: a structure having a first surface and a second surface, and comprising: transparent regions comprising a material formulated to transmit ultraviolet radiation therethrough; and non-transparent regions adjacent the transparent regions; and a polymerizable material directly on surfaces of the transparent regions and the non-transparent regions defining the first surface of the structure. 2. The stamp of claim 1 , wherein the transparent regions comprise glass, calcium fluoride, diamond, a transparent plastic, or a transparent polymer material. 3. The stamp of claim 1 , wherein the non-transparent regions comprise an elastomeric polymer material. 4. The stamp of claim 1 , wherein the transparent regions and the non-transparent regions each extend from the first surface to the second surface. 5. The stamp of claim 1 , wherein the polymerizable material comprises a neutral wetting material. 6. The stamp of claim 1 , wherein the transparent regions and the non-transparent regions exhibit substantially the same widths as one another. 7. The stamp of claim 1 , wherein the polymerizable material comprises a random block copolymer. 8. The stamp of claim 1 , wherein the polymerizable material comprises PS-r-PMMA. 9. The stamp of claim 1 , wherein the polymerizable material is formulated to be cross-linked upon exposure to at least one of ultraviolet radiation and deep ultraviolet radiation. 10. The stamp of claim 1 , wherein the non-transparent regions comprise poly(dimethylsiloxane). 11. The stamp of claim 1 , wherein the transparent regions comprise SiO 2 . 12. The stamp of claim 1 , wherein the transparent regions comprise calcium fluoride. 13. The stamp of claim 1 , wherein the transparent regions comprise diamond. 14. The stamp of claim 1 , wherein: the transparent regions of the structure comprise quartz, calcium fluoride, or diamond; the non-transparent regions of the structure comprise poly(dimethylsiloxane); and the polymerizable material comprises PS-r-PMMA. 15. A method of forming a pattern on a substrate, comprising: forming a stamp comprising: a structure comprising: transparent regions comprising a material formulated to transmit ultraviolet radiation therethrough; and non-transparent regions adjacent the transparent regions; and a polymerizable material directly on surfaces of the transparent regions and the non-transparent regions of the structure; contacting the substrate with the stamp to apply the polymerizable material to the substrate; transmitting radiation through the transparent regions of the structure to polymerize portions of the polymerizable material and form a polymeric material comprising polymerized portions and non-polymerized portions; and removing the structure from the polymeric material. 16. The method of claim 15 , further comprising, removing the non-polymerized portions of the polymeric material relative to the polymerized portions of the polymeric material to expose portions of the substrate. 17. The method of claim 16 , further comprising: forming a block copolymer material over the polymerized portions of the polymeric material and the exposed portions of the substrate; and annealing the block copolymer material to form a self-assembled block copolymer material. 18. The method of claim 17 , further comprising selectively removing one block of the self-assembled block copolymer material relative to another block of the self-assembled block copolymer material.

Assignees

Inventors

Classifications

  • Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title

  • Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements · CPC title

  • Forming nanoscale microstructures using auto-arranging or self-assembling material · CPC title

  • of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6] · CPC title

  • Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

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Frequently asked questions

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What does patent US10005308B2 cover?
Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.
Who is the assignee on this patent?
Micron Technology Inc
What technology area does this patent fall under?
Primary CPC classification B41N1/08. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 26 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).