Methods of forming a stamp and a stamp
US-8956713-B2 · Feb 17, 2015 · US
US10005308B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10005308-B2 |
| Application number | US-201514669612-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 26, 2015 |
| Priority date | Feb 5, 2008 |
| Publication date | Jun 26, 2018 |
| Grant date | Jun 26, 2018 |
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Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.
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What is claimed is: 1. A stamp, comprising: a structure having a first surface and a second surface, and comprising: transparent regions comprising a material formulated to transmit ultraviolet radiation therethrough; and non-transparent regions adjacent the transparent regions; and a polymerizable material directly on surfaces of the transparent regions and the non-transparent regions defining the first surface of the structure. 2. The stamp of claim 1 , wherein the transparent regions comprise glass, calcium fluoride, diamond, a transparent plastic, or a transparent polymer material. 3. The stamp of claim 1 , wherein the non-transparent regions comprise an elastomeric polymer material. 4. The stamp of claim 1 , wherein the transparent regions and the non-transparent regions each extend from the first surface to the second surface. 5. The stamp of claim 1 , wherein the polymerizable material comprises a neutral wetting material. 6. The stamp of claim 1 , wherein the transparent regions and the non-transparent regions exhibit substantially the same widths as one another. 7. The stamp of claim 1 , wherein the polymerizable material comprises a random block copolymer. 8. The stamp of claim 1 , wherein the polymerizable material comprises PS-r-PMMA. 9. The stamp of claim 1 , wherein the polymerizable material is formulated to be cross-linked upon exposure to at least one of ultraviolet radiation and deep ultraviolet radiation. 10. The stamp of claim 1 , wherein the non-transparent regions comprise poly(dimethylsiloxane). 11. The stamp of claim 1 , wherein the transparent regions comprise SiO 2 . 12. The stamp of claim 1 , wherein the transparent regions comprise calcium fluoride. 13. The stamp of claim 1 , wherein the transparent regions comprise diamond. 14. The stamp of claim 1 , wherein: the transparent regions of the structure comprise quartz, calcium fluoride, or diamond; the non-transparent regions of the structure comprise poly(dimethylsiloxane); and the polymerizable material comprises PS-r-PMMA. 15. A method of forming a pattern on a substrate, comprising: forming a stamp comprising: a structure comprising: transparent regions comprising a material formulated to transmit ultraviolet radiation therethrough; and non-transparent regions adjacent the transparent regions; and a polymerizable material directly on surfaces of the transparent regions and the non-transparent regions of the structure; contacting the substrate with the stamp to apply the polymerizable material to the substrate; transmitting radiation through the transparent regions of the structure to polymerize portions of the polymerizable material and form a polymeric material comprising polymerized portions and non-polymerized portions; and removing the structure from the polymeric material. 16. The method of claim 15 , further comprising, removing the non-polymerized portions of the polymeric material relative to the polymerized portions of the polymeric material to expose portions of the substrate. 17. The method of claim 16 , further comprising: forming a block copolymer material over the polymerized portions of the polymeric material and the exposed portions of the substrate; and annealing the block copolymer material to form a self-assembled block copolymer material. 18. The method of claim 17 , further comprising selectively removing one block of the self-assembled block copolymer material relative to another block of the self-assembled block copolymer material.
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