Polyarylene sulfide resin composition and method for producing same

US10000620B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10000620-B2
Application numberUS-201414901322-A
CountryUS
Kind codeB2
Filing dateJun 18, 2014
Priority dateJun 28, 2013
Publication dateJun 19, 2018
Grant dateJun 19, 2018

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Abstract

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A polyarylene sulfide resin composition containing nickel microparticles having an average particle diameter of 0.5 to 20 nm is produced by heating a cyclic polyarylene sulfide in the presence of at least one component selected from components (i), (ii) and (iii).

First claim

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The invention claimed is: 1. A method for producing a polyarylene sulfide resin composition, the method comprising heating a cyclic polyarylene sulfide in the presence of at least one selected from the group consisting of (i), (ii) and (iii): (i) a nickel carboxylate compound including nickel, and a carboxylic acid structure represented by the general formula (A): wherein R 1 represents hydrogen, or a substituent selected from the group consisting of an aryl group with a carbon number of 6 to 24, an alkenyl group with a carbon number of 1 to 12, an alkynyl group with a carbon number of 1 to 12, and a structure (substituent) represented by the formula (B), where hydrogen of each of the substituents may be substituted with an alkyl group with a carbon number of 1 to 12, and in the formula (B), k represents an integer of 0 to 6, m represents an integer of 0 or 1, and n represents an integer of 0 to 6; (ii) a nickel carboxylate-amine complex including a primary amine and a nickel carboxylate compound represented by the general formula (C): [Chemical Formula 2] Ni(R 2 COO)(R 3 COO)  (C) wherein R 2 and R 3 each represent hydrogen or a hydrocarbon group with a carbon number of 1 to 12, where R 2 and R 3 may be the same or mutually different; and (iii) a nickel compound represented by the general formula (D): wherein m represents an integer of 0 to 10, n represents an integer of 1 to 3, and R 4 and R 5 each represent a substituent selected from the group consisting of an alkyl group with a carbon number of 1 to 12, an alkoxy group with a carbon number of 1 to 12, an aryl group with a carbon number of 6 to 24, and a halogen group, where the hydrogen atom of each of the alkyl group, the alkoxy group and the aryl group may be substituted with a halogen atom, and R 4 and R 5 may be the same or mutually different. 2. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the cyclic polyarylene sulfide is heated in the presence of the nickel carboxylate compound of (i) in which R 1 is hydrogen, or a substituent selected from structures where m is 0 in the structure represented by the formula (B). 3. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the cyclic polyarylene sulfide is heated in the presence of the nickel carboxylate compound of (i) in which R 1 is hydrogen, or a substituent selected from structures where k and n are 0 in the structure represented by the formula (B). 4. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the cyclic polyarylene sulfide is heated in the presence of nickel formate. 5. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the cyclic polyarylene sulfide is heated in the presence of the nickel carboxylate-amine complex of (ii) in which R 2 is hydrogen or a hydrocarbon group with a carbon number of 1 to 8. 6. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the cyclic polyarylene sulfide is heated in the presence of the nickel carboxylate-amine complex of (ii) in which the primary amine is an aliphatic amine. 7. The method for producing polyarylene sulfide resin composition according to claim 1 , wherein the heating is performed under degassing conditions. 8. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the cyclic polyarylene sulfide is heated in the presence of the nickel compound of (iii) in which R 4 is a substituent selected from the group consisting of an alkyl group with a carbon number of 1 to 12, an alkoxy group with a carbon number of 1 to 12, and an aryl group with a carbon number of 6 to 24, and R 5 is a substituent selected from the group consisting of an alkyl group with a carbon number of 1 to 12, an alkoxy group with a carbon number of 1 to 12, and an aryl group with a carbon number of 6 to 24, where the hydrogen atom of each of the alkyl group, the alkoxy group and the aryl group may be substituted with a halogen atom, and R 4 and R 5 may be the same or mutually different. 9. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the cyclic polyarylene sulfide is heated in the presence of the nickel compound of (iii) in which R 4 and R 5 are each a methyl group. 10. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the cyclic polyarylene sulfide is heated in the presence of the nickel compound of (iii) in which m is 0. 11. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the resulting polyarylene sulfide resin composition includes nickel fine particles, and the average particle size of the nickel fine particles is 0.5 to 20 nm. 12. The method for producing a polyarylene sulfide resin composition according to claim 1 , wherein the heating is performed under a substantially solvent-free condition.

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What does patent US10000620B2 cover?
A polyarylene sulfide resin composition containing nickel microparticles having an average particle diameter of 0.5 to 20 nm is produced by heating a cyclic polyarylene sulfide in the presence of at least one component selected from components (i), (ii) and (iii).
Who is the assignee on this patent?
Toray Industries
What technology area does this patent fall under?
Primary CPC classification C08K3/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 19 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).