Heat treatable coated glass pane

Patent metadata

Field	Value
Publication number	US-10000412-B2
Application number	US-201414392371-A
Country	US
Kind code	B2
Filing date	Aug 13, 2014
Priority date	Aug 16, 2013
Publication date	Jun 19, 2018
Grant date	Jun 19, 2018

Abstract

A method of manufacturing a coated glass pane comprising the following steps in sequence a) providing a glass substrate, b) depositing by chemical vapour deposition (CVD) at least one CVD coating on a surface of the glass substrate using titanium tetraisopropoxide (TTIP) as a precursor, and c) depositing by physical vapour deposition (PVD) at least one PVD coating on said at least one CVD coating.

First claim

The invention claimed is:

1. A method of manufacturing a heat treatable coated glass pane comprising the following steps in sequence:
a) providing a glass substrate;
b) depositing by chemical vapour deposition (CVD) one or more layers on a surface of the glass substrate to form a CVD coating, said one or more layers forming the CVD coating comprising at least one layer comprising doped or undoped titanium oxide; and wherein the at least one layer comprising titanium oxide is deposited using titanium tetraisopropoxide (TTIP) as a precursor; and
c) depositing by physical vapour deposition (PVD) at least one PVD layer on said at least one CVD coating to form a PVD coating; and
d) heat-treating the coated glass pane to a temperature at or above the softening point of the glass substrate, followed by cooling to toughen the coated glass pane; and wherein the at least one layer comprising titanium oxide and deposited using titanium tetraisopropoxide as precursor is in direct contact with the at least one PVD layer.

2. The method according to claim 1 , wherein the at least one layer comprising a titanium oxide has a thickness of at least 5 nm but at most 60 nm.

3. The method according to claim 1 , wherein the one or more layers on the surface of the glass substrate to form the CVD coating is/are selected from the group comprising: silicon oxide, silicon oxycarbide, silica, silicon oxynitride, doped tin oxide, undoped tin oxide, doped zinc oxide, undoped zinc oxide or a mixture thereof.

4. The method according to claim 1 , wherein a major surface of the CVD coating that is furthest from the glass substrate has an arithmetical mean height of the surface value, Sa, of at most 3 nm.

5. The method according to claim 1 , wherein the CVD coating is deposited on the glass substrate when the glass substrate is at a temperature in the range 450° C. to 800° C.

6. The method according to claim 1 , wherein the PVD coating is deposited by sputter deposition.

7. The method according to claim 1 , wherein the PVD coating comprises at least one functional layer comprising a reflective metal.

8. The method according to claim 7 , wherein the functional layer comprises silver.

9. The method according to claim 7 , wherein the coated pane further comprises a lower anti-reflection layer located between the glass substrate and the at least one functional layer, and wherein the PVD coating further comprises an upper anti-reflection layer located above the functional layer.

10. The method according to claim 7 , wherein the PVD coating further comprises at least one layer comprising a dielectric material deposited between the CVD coating and the at least one functional layer.

11. The method according to claim 7 , wherein the PVD coating further comprises at least one layer comprising doped or undoped NiCr, Ti, Zn, Zr, Sn, Nb, ITO, TiOx, ZnxSnyOz, ZnO, SnOx, ZnxAlxOz, AlNx, SiNx, SixAlyNz or mixtures thereof.

12. The method according to claim 9 , wherein the lower anti-reflection layer of a coating comprising at least one functional layer comprises at least a combination of one or more of the following layers:
a base layer comprising titanium oxide, silicon oxide, silicon oxycarbibe, silica, silicon oxynitride, doped tin oxide, undoped tin oxide, doped zinc oxide, undoped zinc oxide, or a mixture thereof;
a layer comprising a metal oxide of Zn and Sn and/or oxide of Sn;
a separation layer comprising a metal oxide and/or an (oxi)nitride of Si and/or an (oxi)nitride of Al and/or alloys thereof; and
a top layer comprising an oxide of Zn.

13. The method according to claim 9 , wherein the upper anti-reflection layer comprises at least a combination of one or more of the following layers:
a layer comprising and oxide of NiCr;
a layer comprising and oxide of Zn and/or an oxide of Ti;
a layer comprising an (oxi)nitride of Si,
and/or an (oxi)nitride of Al, and/or alloys thereof, and/or an oxide of Al, Si, Ti, and/or Zr; and
a layer comprising a metal oxide of Zn and Sn and/or and oxide of Sn.

Assignees

• Pilkington Group Ltd

Inventors

• Goodwin Clare Jane
• Cheetham Kieran James
• Ridealgh John Andrew
• Edwards Angharad Naomi

Classifications

• C03C17/3411

  with at least two coatings of inorganic materials (C03C17/36, C03C17/42 take precedence) · CPC title

• C03C17/09

  by deposition from the vapour phase · CPC title

• C23C16/405

  of refractory metals or yttrium · CPC title

• C03C17/2456

  Coating containing TiO2 · CPC title

• C03C17/3602

  the metal being present as a layer · CPC title