Pellicle for an euv lithography mask and a method of manufacturing thereof
US-2025189882-A1 · Jun 12, 2025 · US
Wang Han is listed as an inventor on 13 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Wang Han |
| Total patents | 13 |
| First publication | Jan 12, 2023 |
| Latest publication | Jun 12, 2025 |
Publications ranked by popularity score, then publication date.
US-2025189882-A1 · Jun 12, 2025 · US
US-12265323-B2 · Apr 1, 2025 · US
US-2025060663-A1 · Feb 20, 2025 · US
US-12174526-B2 · Dec 24, 2024 · US
US-2024379874-A1 · Nov 14, 2024 · US
US-2024094629-A1 · Mar 21, 2024 · US
US-11860534-B2 · Jan 2, 2024 · US
US-2023411211-A1 · Dec 21, 2023 · US
US-2023259021-A1 · Aug 17, 2023 · US
US-2023205073-A1 · Jun 29, 2023 · US
Latest publications not already listed above.
US-2023037580-A1 · Feb 9, 2023 · US
US-2023044415-A1 · Feb 9, 2023 · US
US-2023008517-A1 · Jan 12, 2023 · US
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Taiwan Semiconductor Mfg Co Ltd | 13 |
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F1/64 | 10 |
| G03F1/62 | 10 |
| G03F1/24 | 10 |
| H10P76/4085 | 5 |
| H10D30/673 | 2 |