Method for measuring photomasks for semiconductor lithography
US-2024280912-A1 · Aug 22, 2024 · US
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Steinert Steffen patents
Steinert Steffen is listed as an inventor on 5 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Steinert Steffen |
| Total patents | 5 |
| First publication | Jan 19, 2017 |
| Latest publication | Aug 22, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Method for measuring photomasks
US-11899358-B2 · Feb 13, 2024 · US
Method for measuring photomasks
US-2021255541-A1 · Aug 19, 2021 · US
Method and apparatus for determining the position of structure elements of a photolithographic mask
US-10380733-B2 · Aug 13, 2019 · US
Method and apparatus for determining the position of structure elements of a photolithographic mask
US-2017018064-A1 · Jan 19, 2017 · US
Recent patents
Latest publications not already listed above.
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Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 5 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F1/84 | 5 |
| G06T7/001 | 2 |
| G06T2207/10056 | 2 |
| G06T2207/30148 | 2 |
| G06T7/74 | 2 |