Method for producing a substrate for an optical element, and reflective optical element
US-2025093557-A1 · Mar 20, 2025 · US
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Siekmann Heiko patents
Siekmann Heiko is listed as an inventor on 8 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Siekmann Heiko |
| Total patents | 8 |
| First publication | Mar 10, 2015 |
| Latest publication | Mar 20, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Method for producing a substrate for an optical element
US-12196986-B2 · Jan 14, 2025 · US
Method for producing a substrate for an optical element, and reflective optical element
US-2021072435-A1 · Mar 11, 2021 · US
Illumination system for a microlithographic projection exposure apparatus
US-9575414-B2 · Feb 21, 2017 · US
Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type
US-9541685-B2 · Jan 10, 2017 · US
Illumination system for a microlithographic projection exposure apparatus
US-2016077446-A1 · Mar 17, 2016 · US
Illumination system for a microlithographic projection exposure apparatus
US-9217930-B2 · Dec 22, 2015 · US
Substrate for mirrors for EUV lithography
US-8976927-B2 · Mar 10, 2015 · US
Recent patents
Latest publications not already listed above.
No data yet.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 8 |
| Zeiss Carl Laser Optics Gmbh | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G02B5/0891 | 5 |
| G03F7/70083 | 3 |
| G03F7/70058 | 3 |
| G03F7/70158 | 3 |
| G03F7/70075 | 3 |