Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method
US-12422743-B2 · Sep 23, 2025 · US
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Hellweg Dirk patents
Hellweg Dirk is listed as an inventor on 26 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Hellweg Dirk |
| Total patents | 26 |
| First publication | Jul 14, 2015 |
| Latest publication | Sep 23, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Method for heating an optical element in a microlithographic projection exposure apparatus and optical system
US-12353141-B2 · Jul 8, 2025 · US
Method for heating an optical element in a microlitho-graphic projection exposure apparatus and optical system
US-2023350312-A1 · Nov 2, 2023 · US
Method for the qualification of a mask for microlithography
US-11460785-B2 · Oct 4, 2022 · US
Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method
US-2022236648-A1 · Jul 28, 2022 · US
Method for approximating imaging properties of an optical production system to those of an optical measurement system, and metrology system to this end
US-2022057709-A1 · Feb 24, 2022 · US
Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method
US-11256178-B2 · Feb 22, 2022 · US
Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth
US-11061331-B2 · Jul 13, 2021 · US
Metrology system having an EUV optical unit
US-10948637-B2 · Mar 16, 2021 · US
Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method
US-2020393751-A1 · Dec 17, 2020 · US
Recent patents
Latest publications not already listed above.
Method for examining photolithographic masks and mask metrology apparatus for performing the method
US-10775691-B2 · Sep 15, 2020 · US
Method for the qualification of a mask for microlithography
US-2020285158-A1 · Sep 10, 2020 · US
Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method
US-10761420-B2 · Sep 1, 2020 · US
Method for determining a focus position of a lithography mask and metrology system for carrying out such a method
US-10564551-B2 · Feb 18, 2020 · US
Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks
US-10481505-B2 · Nov 19, 2019 · US
Method for determining a structure-independent contribution of a lithogrpahy mask to a fluctuation of the linewidth
US-2019258176-A1 · Aug 22, 2019 · US
Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks
US-2019258170-A1 · Aug 22, 2019 · US
Method for determining a focus position of a lithography mask and metrology system for carrying out such a method
US-2019258180-A1 · Aug 22, 2019 · US
Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method
US-2019129320-A1 · May 2, 2019 · US
Method for examining photolithographic masks and mask metrology apparatus for performing the method
US-2019079381-A1 · Mar 14, 2019 · US
Metrology system having an euv optical unit
US-2019011615-A1 · Jan 10, 2019 · US
Method for measuring an angularly resolved intensity distribution and projection exposure apparatus
US-2018299787-A1 · Oct 18, 2018 · US
Method for measuring an angularly resolved intensity distribution and projection exposure apparatus
US-9915871-B2 · Mar 13, 2018 · US
Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
US-9785052-B2 · Oct 10, 2017 · US
Method for measuring an angularly resolved intensity distribution and projection exposure apparatus
US-2016011520-A1 · Jan 14, 2016 · US
Method for measuring an angularly resolved intensity distribution and projection exposure apparatus
US-9081294-B2 · Jul 14, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 26 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F1/84 | 19 |
| G03F7/70666 | 8 |
| G03F7/705 | 6 |
| G03F7/70641 | 6 |
| G03F7/70516 | 6 |