Ehm Dirk patents

• Residual gas analyser, and EUV lithography system having a residual gas analyser

  US-12573604-B2 · Mar 10, 2026 · US

• Euv collector for use in an euv projection exposure apparatus

  US-2025258436-A1 · Aug 14, 2025 · US

• Projection exposure apparatus having a device for determining the concentration of atomic hydrogen

  US-12306551-B2 · May 20, 2025 · US

• Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus

  US-12140877-B2 · Nov 12, 2024 · US

• Method for depositing a cover layer, euv lithography system and optical element

  US-2024302756-A1 · Sep 12, 2024 · US

• Multi-mirror array

  US-2024248408-A1 · Jul 25, 2024 · US

• Process for deposition of an outer layer, reflective optical element for the euv wavelength range and euv lithography system

  US-2024111216-A1 · Apr 4, 2024 · US

• Residual gas analyser, and euv lithography system having a residual gas analyser

  US-2023162967-A1 · May 25, 2023 · US

• Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus

  US-2022308463-A1 · Sep 29, 2022 · US

• Projection exposure apparatus having a device for determining the concentration of atomic hydrogen

  US-2022308457-A1 · Sep 29, 2022 · US

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