PAG-free positive chemically amplified resist composition and methods of using the same
US-12360453-B2 · Jul 15, 2025 · US
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Chen Hung-Yang patents
Chen Hung-Yang is listed as an inventor on 7 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Chen Hung-Yang |
| Total patents | 7 |
| First publication | Feb 14, 2019 |
| Latest publication | Jul 15, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Novolak/DNQ based, chemically amplified photoresist
US-12276909-B2 · Apr 15, 2025 · US
Positive-working photoresist composition with improved pattern profile and depth of focus (dof)
US-2024045333-A1 · Feb 8, 2024 · US
Pag-free positive chemically amplified resist composition and methods of using the same
US-2022404702-A1 · Dec 22, 2022 · US
Novolak/dnq based, chemically amplified photoresist
US-2021382390-A1 · Dec 9, 2021 · US
Semiconducting polymer
US-10815236-B2 · Oct 27, 2020 · US
Semiconducting polymer
US-2019048015-A1 · Feb 14, 2019 · US
Recent patents
Latest publications not already listed above.
No data yet.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Merck Patent Gmbh | 5 |
| Basf Se | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0236 | 5 |
| G03F7/0226 | 5 |
| G03F7/023 | 4 |
| G03F7/022 | 4 |
| G03F7/20 | 4 |