Method for computational metrology and inspection for patterns to be manufactured on a substrate
US-2025292389-A1 · Sep 18, 2025 · US
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Baranwal Ajay patents
Baranwal Ajay is listed as an inventor on 12 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Baranwal Ajay |
| Total patents | 12 |
| First publication | Feb 13, 2020 |
| Latest publication | Sep 18, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Method and system for reticle enhancement technology
US-2025237940-A1 · Jul 24, 2025 · US
Method for computational metrology and inspection for patterns to be manufactured on a substrate
US-12340495-B2 · Jun 24, 2025 · US
Method and system for reticle enhancement technology
US-12287567-B2 · Apr 29, 2025 · US
Method and system for reticle enhancement technology
US-2024201577-A1 · Jun 20, 2024 · US
Modeling of a design in reticle enhancement technology
US-2024086607-A1 · Mar 14, 2024 · US
Method and system for reticle enhancement technology
US-11921420-B2 · Mar 5, 2024 · US
Method and system for reticle enhancement technology
US-2023244137-A1 · Aug 3, 2023 · US
Method for computational metrology and inspection for patterns to be manufactured on a substrate
US-2023037918-A1 · Feb 9, 2023 · US
Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography
US-11264206-B2 · Mar 1, 2022 · US
Recent patents
Latest publications not already listed above.
Major assignees
Companies most often associated with this inventor's publications.
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/705 | 8 |
| G03F1/70 | 6 |
| G03F1/36 | 6 |
| G06T2207/20081 | 5 |
| G06T2207/20084 | 5 |