Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound
US-12554196-B2 · Feb 17, 2026 · US
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Patent family 78744438
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 78744438 |
| Family type | — |
| Earliest priority | May 29, 2020 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US12554196B2 — Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound |
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US12554196B2 — Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound (published Feb 17, 2026)
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