Process environment for inorganic resist patterning
US-2026072354-A1 · Mar 12, 2026 · US
This patent family groups 6 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 77463564 |
| Family type | — |
| Earliest priority | Mar 2, 2020 |
| First filing country | US |
| Member publications | 6 |
| Countries | US |
| Representative publication | US2026072354A1 — Process environment for inorganic resist patterning |
Best representative member for this family based on priority and filing country.
US2026072354A1 — Process environment for inorganic resist patterning (published Mar 12, 2026)
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