Device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography
US-11079604-B2 · Aug 3, 2021 · US
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Patent family 69780980
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 69780980 |
| Family type | — |
| Earliest priority | Oct 2, 2018 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US11079604B2 — Device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography |
Representative publication
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US11079604B2 — Device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography (published Aug 3, 2021)
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