Precursors and flowable CVD methods for making low-K films to fill surface features
US-11017998-B2 · May 25, 2021 · US
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Patent family 63917463
This patent family groups 3 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 63917463 |
| Family type | — |
| Earliest priority | Aug 30, 2016 |
| First filing country | US |
| Member publications | 3 |
| Countries | US |
| Representative publication | US11017998B2 — Precursors and flowable CVD methods for making low-K films to fill surface features |
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US11017998B2 — Precursors and flowable CVD methods for making low-K films to fill surface features (published May 25, 2021)
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