Patterning process with silicon mask layer
US-10115592-B2 · Oct 30, 2018 · US
This page is not indexed by search engines while we improve data quality.
Patent family 62562001
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 62562001 |
| Family type | — |
| Earliest priority | Dec 15, 2016 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10115592B2 — Patterning process with silicon mask layer |
Representative publication
Best representative member for this family based on priority and filing country.
US10115592B2 — Patterning process with silicon mask layer (published Oct 30, 2018)
Member publications
Related publications in this family.
Patterning Process with Silicon Mask Layer
US-2018174828-A1 · Jun 21, 2018 · US