Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-10128108-B2 · Nov 13, 2018 · US
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 56074204 |
| Family type | — |
| Earliest priority | Nov 25, 2014 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10128108B2 — Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target |
Best representative member for this family based on priority and filing country.
US10128108B2 — Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target (published Nov 13, 2018)
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