Etching method
US-2022051904-A1 · Feb 17, 2022 · US
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Patent family 55409767
This patent family groups 4 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 55409767 |
| Family type | — |
| Earliest priority | Feb 24, 2015 |
| First filing country | US |
| Member publications | 4 |
| Countries | US |
| Representative publication | US2022051904A1 — Etching method |
Representative publication
Best representative member for this family based on priority and filing country.
US2022051904A1 — Etching method (published Feb 17, 2022)
Member publications
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Method of selectively etching silicon oxide film on substrate
US-11205577-B2 · Dec 21, 2021 · US
Method of selectively etching silicon oxide film on substrate
US-2018190505-A1 · Jul 5, 2018 · US
Etching method
US-2016247691-A1 · Aug 25, 2016 · US