Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound
US-9523912-B2 · Dec 20, 2016 · US
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Patent family 51428443
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 51428443 |
| Family type | — |
| Earliest priority | Mar 1, 2013 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US9523912B2 — Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound |
Representative publication
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US9523912B2 — Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound (published Dec 20, 2016)
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