Monitor system for determining orientations of mirror elements and EUV lithography system
US-9563129-B2 · Feb 7, 2017 · US
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Patent family 50336971
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 50336971 |
| Family type | — |
| Earliest priority | Oct 5, 2012 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US9563129B2 — Monitor system for determining orientations of mirror elements and EUV lithography system |
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US9563129B2 — Monitor system for determining orientations of mirror elements and EUV lithography system (published Feb 7, 2017)
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