CMP compositions selective for oxide and nitride with high removal rate and low defectivity
US-9238753-B2 · Jan 19, 2016 · US
This patent family groups 1 related publication across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 49158024 |
| Family type | — |
| Earliest priority | Mar 14, 2012 |
| First filing country | US |
| Member publications | 1 |
| Countries | US |
| Representative publication | US9238753B2 — CMP compositions selective for oxide and nitride with high removal rate and low defectivity |
Best representative member for this family based on priority and filing country.
US9238753B2 — CMP compositions selective for oxide and nitride with high removal rate and low defectivity (published Jan 19, 2016)
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