High-purity copper-chromium alloy sputtering target
US-10297429-B2 · May 21, 2019 · US
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Patent family 48873409
This patent family groups 1 related publication across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 48873409 |
| Family type | — |
| Earliest priority | Jan 25, 2012 |
| First filing country | US |
| Member publications | 1 |
| Countries | US |
| Representative publication | US10297429B2 — High-purity copper-chromium alloy sputtering target |
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US10297429B2 — High-purity copper-chromium alloy sputtering target (published May 21, 2019)
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