Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device
US-9430597-B2 · Aug 30, 2016 · US
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Patent family 47882311
This patent family groups 1 related publication across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 47882311 |
| Family type | — |
| Earliest priority | Dec 21, 2012 |
| First filing country | US |
| Member publications | 1 |
| Countries | US |
| Representative publication | US9430597B2 — Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device |
Representative publication
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US9430597B2 — Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device (published Aug 30, 2016)
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