Measuring and controlling wafer potential in pulsed RF bias processing
US-9659757-B2 · May 23, 2017 · US
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Patent family 39201042
This patent family groups 1 related publication across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 39201042 |
| Family type | — |
| Earliest priority | Sep 20, 2006 |
| First filing country | US |
| Member publications | 1 |
| Countries | US |
| Representative publication | US9659757B2 — Measuring and controlling wafer potential in pulsed RF bias processing |
Representative publication
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US9659757B2 — Measuring and controlling wafer potential in pulsed RF bias processing (published May 23, 2017)
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