using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering

using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering · Cooperative Patent Classification (CPC)

Electric circuits, power, telecommunications, and semiconductors.

Related technology areas

Mapped technology topics for this CPC code.

CPC classification statistics
MetricValue
CPC codeH10K71/16
Official titleusing physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
Display labelusing physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
Total patents811

Filing trend

Year-over-year patent counts classified under this CPC code.

Filing activity over the last five years is stable.

Patents filed per year
YearPatents
201567
201670
201766
201868
201990
202066
202175
202255
202380
202475
202581
202618

Representative patents

Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.

Frequently asked questions

Answers are generated from the same data shown on this page.

What is CPC H10K71/16?
CPC H10K71/16 is the Cooperative Patent Classification code for “using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering.”
How many patents are filed under CPC H10K71/16 (using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering)?
Our database includes 811 publications tagged with this CPC code.
Is patent activity under CPC H10K71/16 growing?
Publication counts under this code: 75 in 2024 vs 81 in 2025 (latest complete years).