Field effect semiconductor component and methods for operating and producing it
US-2015380511-A1 · Dec 31, 2015 · US
Electricity
Electricity · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H01L29/511 |
| Official title | — |
| Display label | Electricity (mapped technology topic) |
| Total patents | 613 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 72 |
| 2016 | 106 |
| 2017 | 92 |
| 2018 | 73 |
| 2019 | 66 |
| 2020 | 57 |
| 2021 | 44 |
| 2022 | 36 |
| 2023 | 30 |
| 2024 | 32 |
| 2025 | 5 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Semiconductor device and manufacturing method thereof
US-2015380425-A1 · Dec 31, 2015 · US
Methods of making three dimensional nand devices
US-2015380424-A1 · Dec 31, 2015 · US
High-k dielectrics with a low-k interface for solution processed devices
US-9219126-B2 · Dec 22, 2015 · US
Device and methods for high-k and metal gate stacks
US-9219125-B2 · Dec 22, 2015 · US
Semiconductor memory devices and methods of fabricating the same
US-2015357346-A1 · Dec 10, 2015 · US
Nonvolatile semiconductor memory device and production method for the same
US-9209315-B2 · Dec 8, 2015 · US
Nonvolatile semiconductor memory device
US-2015349081-A1 · Dec 3, 2015 · US
Semiconductor device and method for manufacturing thereof
US-9202809-B2 · Dec 1, 2015 · US
Method and Apparatus For Enhancing Channel Strain
US-2015340293-A1 · Nov 26, 2015 · US
Semiconductor device having a gate dielectric film which is thinner below a source or drain electrode than below a channel region
US-9196698-B2 · Nov 24, 2015 · US
Semiconductor Component with a Monocrystalline Semiconductor Region Arranged in a Via Region
US-2015333134-A1 · Nov 19, 2015 · US
Semiconductor device dielectric interface layer
US-9177784-B2 · Nov 3, 2015 · US
Field Effect Transistor Constructions And Methods Of Programming Field Effect Transistors To One Of At Least Three Different Programmed States
US-2015310905-A1 · Oct 29, 2015 · US
High-k dielectrics with a low-k interface for solution processed devices
US-2015311307-A1 · Oct 29, 2015 · US
Hydrogen-free silicon-based deposited dielectric films for nano device fabrication
US-2015287593-A1 · Oct 8, 2015 · US
Method for forming a split-gate device
US-2015279854-A1 · Oct 1, 2015 · US
Semiconductor device and method for forming the same
US-2015263111-A1 · Sep 17, 2015 · US
Semiconductor Device and Method of Manufacturing the Semiconductor Device
US-2015255562-A1 · Sep 10, 2015 · US
Methods of forming semiconductor structures comprising aluminum oxide
US-9129798-B1 · Sep 8, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H01L29/511?
- CPC H01L29/511 is the Cooperative Patent Classification code for “Electricity.”
- How many patents are filed under CPC H01L29/511 (Electricity)?
- Our database includes 613 publications tagged with this CPC code.
- Is patent activity under CPC H01L29/511 growing?
- Publication counts under this code: 32 in 2024 vs 5 in 2025 (latest complete years).