Photomask laser etch
US-10802392-B2 · Oct 13, 2020 · US
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Physics
Physics · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F1/003 |
| Official title | — |
| Display label | Physics (mapped technology topic) |
| Total patents | 7 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity appears to be growing based on the most recent years.
| Year | Patents |
|---|---|
| 2015 | 3 |
| 2017 | 1 |
| 2018 | 1 |
| 2020 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Photomask laser etch
US-2020057362-A1 · Feb 20, 2020 · US
Methods of detecting defects in registration controlled photomasks
US-10026166-B2 · Jul 17, 2018 · US
Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
US-9713919-B2 · Jul 25, 2017 · US
Apparatus for preparing relief printing form
US-9201314-B2 · Dec 1, 2015 · US
Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
US-9134612-B2 · Sep 15, 2015 · US
Method for preparing relief printing form
US-9063437-B2 · Jun 23, 2015 · US