Reducing agent as corrosion inhibitor for neutral or low alkaline warewash detergent
US-2023348818-A1 · Nov 2, 2023 · US
combined with specific additives
combined with specific additives · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C11D3/3902 |
| Official title | {combined with specific additives} |
| Display label | combined with specific additives |
| Total patents | 88 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 7 |
| 2016 | 6 |
| 2017 | 8 |
| 2018 | 2 |
| 2019 | 6 |
| 2020 | 5 |
| 2021 | 12 |
| 2022 | 8 |
| 2023 | 10 |
| 2024 | 12 |
| 2025 | 9 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Device and methods for depositing materials on hard surfaces
US-11701681-B2 · Jul 18, 2023 · US
Anhydrous autodish formulation
US-11680227-B2 · Jun 20, 2023 · US
Compositions and methods for removing soil from surfaces
US-2023124683-A1 · Apr 20, 2023 · US
Cleaning Composition Comprising Bacterial Spores
US-2023039859-A1 · Feb 9, 2023 · US
Compositions and methods for removing soil from surfaces
US-11566207-B2 · Jan 31, 2023 · US
Anhydrous autodish formulation
US-2022403296-A1 · Dec 22, 2022 · US
Hard surface cleaning composition
US-2022315863-A1 · Oct 6, 2022 · US
Automatic dishwashing detergent composition
US-11459528-B2 · Oct 4, 2022 · US
Automatic dishwashing method
US-11414629-B2 · Aug 16, 2022 · US
Composition and process for electively etching a hard mask and/or an etch-stop layer in the presence of layers of low-k materials, copper, cobalt and/or tungsten
US-2022220421-A1 · Jul 14, 2022 · US
Ethoxylated Glycerol Ester-Containing Detergent For Machine Dishwashing
US-2022213412-A1 · Jul 7, 2022 · US
Cleaning composition and cleaning method for component of semiconductor manufacturing process chamber
US-2022135916-A1 · May 5, 2022 · US
Peracid compositions with conductivity monitoring capability
US-2022072591-A1 · Mar 10, 2022 · US
Stable Nitric Acid Blends And Uses Thereof
US-2021380906-A1 · Dec 9, 2021 · US
Peracid compositions with conductivity monitoring capability
US-11185893-B2 · Nov 30, 2021 · US
Compositions and methods for removing soil from surfaces
US-2021355413-A1 · Nov 18, 2021 · US
Detergent compositions, cleaning systems and methods of cleaning cosmetic and other soils
US-2021301220-A1 · Sep 30, 2021 · US
Detergent composition
US-2021269749-A1 · Sep 2, 2021 · US
Use of urea or a urea/chelator combination to chemically stabilize peroxycarboxylic acid and peroxide formulations
US-2021246401-A1 · Aug 12, 2021 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C11D3/3902?
- CPC C11D3/3902 is the Cooperative Patent Classification code for “combined with specific additives.”
- How many patents are filed under CPC C11D3/3902 (combined with specific additives)?
- Our database includes 88 publications tagged with this CPC code.
- Is patent activity under CPC C11D3/3902 growing?
- Publication counts under this code: 12 in 2024 vs 9 in 2025 (latest complete years).