Composition and process for selectively etching a hard mask and/or an etch-stop layer in the presence of layers of low-k materials, copper, cobalt and/or tungsten
US-12590274-B2 · Mar 31, 2026 · US
containing sulfone groups, e.g. vinyl sulfones · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C11D3/3454 |
| Official title | {containing sulfone groups, e.g. vinyl sulfones} |
| Display label | containing sulfone groups, e.g. vinyl sulfones |
| Total patents | 42 |
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2015 | 1 |
| 2016 | 2 |
| 2018 | 1 |
| 2019 | 2 |
| 2020 | 3 |
| 2021 | 3 |
| 2022 | 7 |
| 2023 | 8 |
| 2024 | 4 |
| 2025 | 9 |
| 2026 | 2 |
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
US-12590274-B2 · Mar 31, 2026 · US
US-2026071149-A1 · Mar 12, 2026 · US
US-12509598-B2 · Dec 30, 2025 · US
US-12492360-B2 · Dec 9, 2025 · US
US-12480074-B2 · Nov 25, 2025 · US
US-2025207067-A1 · Jun 26, 2025 · US
US-2025207066-A1 · Jun 26, 2025 · US
US-2025129309-A1 · Apr 24, 2025 · US
US-12275921-B2 · Apr 15, 2025 · US
US-12221595-B2 · Feb 11, 2025 · US
US-2025043215-A1 · Feb 6, 2025 · US
US-12074034-B2 · Aug 27, 2024 · US
US-2024209285-A1 · Jun 27, 2024 · US
US-2024199998-A1 · Jun 20, 2024 · US
US-11952560-B2 · Apr 9, 2024 · US
US-2023340370-A1 · Oct 26, 2023 · US
US-11795417-B2 · Oct 24, 2023 · US
US-2023287304-A1 · Sep 14, 2023 · US
US-2023220311-A1 · Jul 13, 2023 · US
US-2023174904-A1 · Jun 8, 2023 · US
Answers are generated from the same data shown on this page.