Resist composition and patterning process
US-2018373150-A1 · Dec 27, 2018 · US
of phenols or of alcohols containing two or more carbon atoms
of phenols or of alcohols containing two or more carbon atoms · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F220/16 |
| Official title | of phenols or of alcohols containing two or more carbon atoms |
| Display label | of phenols or of alcohols containing two or more carbon atoms |
| Total patents | 163 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 12 |
| 2016 | 12 |
| 2017 | 15 |
| 2018 | 38 |
| 2019 | 15 |
| 2020 | 25 |
| 2021 | 17 |
| 2022 | 9 |
| 2023 | 11 |
| 2024 | 3 |
| 2025 | 5 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Resist composition and patterning process
US-2018364574-A1 · Dec 20, 2018 · US
Lubricant compositions for improved high pressure free-radical polymerizations
US-10144898-B2 · Dec 4, 2018 · US
Radiation-sensitive resin composition and resist pattern-forming method
US-2018329298-A1 · Nov 15, 2018 · US
Olefin-acrylate copolymers with pendant hydroxyl functionality and use thereof
US-2018305480-A1 · Oct 25, 2018 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
US-2018292751-A1 · Oct 11, 2018 · US
Resist composition and method of forming resist pattern
US-2018284612-A1 · Oct 4, 2018 · US
Resist composition and patterning process
US-2018275512-A1 · Sep 27, 2018 · US
Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film
US-2018275518-A1 · Sep 27, 2018 · US
Resist composition and patterning process
US-2018267402-A1 · Sep 20, 2018 · US
Pattern forming method and method for manufacturing electronic device
US-2018267404-A1 · Sep 20, 2018 · US
Ablative Material with a Polymeric Phosphorylated Amide
US-2018251632-A1 · Sep 6, 2018 · US
Methods for making improved quantum dot resin formulations
US-2018230377-A1 · Aug 16, 2018 · US
Solvent-Free Supersoft and Superelastic Materials
US-2018201785-A1 · Jul 19, 2018 · US
Copolymer including ultraviolet light-absorbing group and compositions including the same
US-2018187053-A1 · Jul 5, 2018 · US
Polymer compositions comprising cross-linked polymers comprising boronic ester functions enabling exchange reactions, process for preparing them and their use
US-10011711-B2 · Jul 3, 2018 · US
Resin composition and method of forming resist pattern
US-2018180997-A1 · Jun 28, 2018 · US
Polymer compositions comprising cross-linked polymers comprising boronic ester functions enabling exchange reactions, process for preparing them and their use
US-10005900-B2 · Jun 26, 2018 · US
Multimodal polyethylene copolymer
US-2018148570-A1 · May 31, 2018 · US
Fluoropolymers and membranes comprising fluoropolymers (iii)
US-2018078908-A1 · Mar 22, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08F220/16?
- CPC C08F220/16 is the Cooperative Patent Classification code for “of phenols or of alcohols containing two or more carbon atoms.”
- How many patents are filed under CPC C08F220/16 (of phenols or of alcohols containing two or more carbon atoms)?
- Our database includes 163 publications tagged with this CPC code.
- Is patent activity under CPC C08F220/16 growing?
- Publication counts under this code: 3 in 2024 vs 5 in 2025 (latest complete years).