Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, compound, and resin
US-2024419071-A1 · Dec 19, 2024 · US
Monomers containing only one unsaturated aliphatic radical · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F12/02 |
| Official title | Monomers containing only one unsaturated aliphatic radical |
| Display label | Monomers containing only one unsaturated aliphatic radical |
| Total patents | 12 |
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 1 |
| 2016 | 1 |
| 2017 | 1 |
| 2018 | 1 |
| 2019 | 3 |
| 2020 | 1 |
| 2023 | 2 |
| 2024 | 2 |
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
US-2024419071-A1 · Dec 19, 2024 · US
US-2024219831-A1 · Jul 4, 2024 · US
US-2023348351-A1 · Nov 2, 2023 · US
US-2023104260-A1 · Apr 6, 2023 · US
US-2020087429-A1 · Mar 19, 2020 · US
US-10513568-B2 · Dec 24, 2019 · US
US-10472490-B2 · Nov 12, 2019 · US
US-2019169327-A1 · Jun 6, 2019 · US
US-2018112056-A1 · Apr 26, 2018 · US
US-9580532-B1 · Feb 28, 2017 · US
US-9240500-B2 · Jan 19, 2016 · US
US-8999631-B2 · Apr 7, 2015 · US