Radiation-sensitive composition, method for forming pattern, and radiation-sensitive acid generator
US-2025362596-A1 · Nov 27, 2025 · US
condensed with ring systems containing two or more relevant rings
condensed with ring systems containing two or more relevant rings · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07D317/70 |
| Official title | condensed with ring systems containing two or more relevant rings |
| Display label | condensed with ring systems containing two or more relevant rings |
| Total patents | 65 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 4 |
| 2016 | 9 |
| 2017 | 10 |
| 2018 | 2 |
| 2019 | 4 |
| 2020 | 9 |
| 2021 | 6 |
| 2022 | 4 |
| 2023 | 6 |
| 2024 | 4 |
| 2025 | 5 |
| 2026 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Photochromic compound, naphthol derivative, curable composition, optical article, lens, and eyeglasses
US-2025101294-A1 · Mar 27, 2025 · US
Amber odorant
US-12139469-B2 · Nov 12, 2024 · US
Radiation-sensitive composition, resist pattern formation method, polymer, and compound
US-2024319596-A1 · Sep 26, 2024 · US
Spirocyclohexane derivatives, pharmaceutical compositions containing them and their uses as anti-apoptotic inhibitors
US-2024150293-A1 · May 9, 2024 · US
Ester compound
US-2024067597-A1 · Feb 29, 2024 · US
Indene derivatives and uses thereof
US-11731952-B2 · Aug 22, 2023 · US
(3aS,4aR,5S,7aS,9R,9aR)-2,2,5,8,8,9a-hexamethyloctahydro-4H-4a,9-methanoazuleno[5,6-d][1,3]dioxole
US-2023219918-A1 · Jul 13, 2023 · US
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound
US-2023148344-A1 · May 11, 2023 · US
(3aS,4aR,5S,7aS,9R,9aR)-2,2,5,8,8,9a-hexamethyloctahydro-4H-4a,9-methanoazuleno[5,6-d][1,3]dioxole
US-11634402-B2 · Apr 25, 2023 · US
Radiation-sensitive resin composition and resist pattern-forming method
US-11609495-B2 · Mar 21, 2023 · US
Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid
US-11592746-B2 · Feb 28, 2023 · US
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
US-11467489-B2 · Oct 11, 2022 · US
Materials for organic electroluminescent devices
US-2022140245-A1 · May 5, 2022 · US
Amber odorant
US-2022106285-A1 · Apr 7, 2022 · US
(3aS,4aR,5S,7aS,9R,9aR)-2,2,5,8,8,9a-hexamethyloctahydro-4H-4a,9-methanoazuleno[5,6-d][1,3]dioxole
US-2022041569-A1 · Feb 10, 2022 · US
Radiation-sensitive resin composition and resist pattern-forming method
US-2021389667-A9 · Dec 16, 2021 · US
Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid
US-2021263413-A9 · Aug 26, 2021 · US
Use of ambrocenide® for intensifying a lily of the valley scent
US-11091723-B2 · Aug 17, 2021 · US
Blends containing enantiomerically pure Ambrocenide®
US-11066625-B2 · Jul 20, 2021 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07D317/70?
- CPC C07D317/70 is the Cooperative Patent Classification code for “condensed with ring systems containing two or more relevant rings.”
- How many patents are filed under CPC C07D317/70 (condensed with ring systems containing two or more relevant rings)?
- Our database includes 65 publications tagged with this CPC code.
- Is patent activity under CPC C07D317/70 growing?
- Publication counts under this code: 4 in 2024 vs 5 in 2025 (latest complete years).