Salts and photoresists comprising same
US-11880134-B2 · Jan 23, 2024 · US
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polycyclic
polycyclic · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C62/06 |
| Official title | polycyclic |
| Display label | polycyclic |
| Total patents | 8 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2018 | 1 |
| 2019 | 3 |
| 2021 | 1 |
| 2022 | 1 |
| 2023 | 1 |
| 2024 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Cosmetic composition comprising vetiver root extract
US-11654102-B2 · May 23, 2023 · US
Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acid
US-11320735-B2 · May 3, 2022 · US
Cosmetic Composition Comprising Vetiver Root Extract
US-2021030663-A1 · Feb 4, 2021 · US
Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acid
US-2019391488-A1 · Dec 26, 2019 · US
Process for the preparation of standardized composition of arjunoglucoside from the bark of Terminalia arjuna
US-10479749-B2 · Nov 19, 2019 · US
Salts and photoresists comprising same
US-2019163058-A1 · May 30, 2019 · US
PROCESS FOR THE PREPARATION OF STANDARDIZED COMPOSITION OF ARJUNOGLUCOSIDE FROM THE BARK OF Terminalia arjuna
US-2018370885-A1 · Dec 27, 2018 · US